Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters

We developed a control system for an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) reactor for the growth of inhomogeneous dielectric thin films for optical applications. The system supervises the growth of films of a required refractive index profile on differen...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2000-01, Vol.18 (1), p.74-78
Hauptverfasser:	Swart, Pieter L., Lacquet, Beatrys M., Chtcherbakov, Anatoli A., Bulkin, Pavel V.
Format:	Artikel
Sprache:	eng
Schlagworte:	Dielectric materials Electron cyclotron resonance Engineering Sciences Film growth Microwave generation Optical fibers Plasma enhanced chemical vapor deposition Refractive index Substrates Thin films
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container_issue	1
container_start_page	74
container_title	Journal of vacuum science & technology. A, Vacuum, surfaces, and films
container_volume	18
creator	Swart, Pieter L. Lacquet, Beatrys M. Chtcherbakov, Anatoli A. Bulkin, Pavel V.
description	We developed a control system for an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) reactor for the growth of inhomogeneous dielectric thin films for optical applications. The system supervises the growth of films of a required refractive index profile on different substrates including optical fiber ends. It controls the gas flow rates, microwave power, radio frequency substrate bias, and the ECR and extraction magnet power supplies. The system also adjusts the microwave generator to minimize reflected power during deposition. The characteristics of the ECR-PECVD system and the automation of the deposition process are discussed using the growth of a complex rugate optical filter as an example.
doi_str_mv	10.1116/1.582120
format	Article
fullrecord	<record><control><sourceid>proquest_hal_p</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_00915351v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>746166838</sourcerecordid><originalsourceid>FETCH-LOGICAL-c359t-48dafa5dbe641850a37b0ebf4ebd5e295fdd2fa1a5f47f1b8869fa7357d7ae8a3</originalsourceid><addsrcrecordid>eNp9kcGO1DAMhiMEEsOy0j5CbsChS9w2bXocrVgWaSQu7DlyE2dblDYlyQzM22-HQcMBiZPtX59_WzZjNyBuAaD5CLdSlVCKF2wDshSFkrJ7yTaireqiBAGv2ZuUvgshylI0G_Zru89hwkyWkyeTY5i5ORoffmeRUphxNsQXj2lCTvNwKi03A02jQc8PuITILS0hjXlce9IxZZq4W9U8EH-K4WceeHA87p_WOdyNPlNMb9krhz7R9Z94xR7vP327eyh2Xz9_udvuClPJLhe1suhQ2p6aGpQUWLW9oN7V1FtJZSedtaVDQOnq1kGvVNM5bCvZ2hZJYXXFPpx9B_R6ieOE8agDjvphu9MnTYgOZCXhACv77swuMfzYU8p6GpMh73GmsE-6rRtoGlWplXx_Jk0MKUVyF2sQ-vQHDfr8h78LJDNmPJ3owh5CvHB6se5_7D--z0cimNQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>746166838</pqid></control><display><type>article</type><title>Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters</title><source>AIP Journals Complete</source><creator>Swart, Pieter L. ; Lacquet, Beatrys M. ; Chtcherbakov, Anatoli A. ; Bulkin, Pavel V.</creator><creatorcontrib>Swart, Pieter L. ; Lacquet, Beatrys M. ; Chtcherbakov, Anatoli A. ; Bulkin, Pavel V.</creatorcontrib><description>We developed a control system for an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) reactor for the growth of inhomogeneous dielectric thin films for optical applications. The system supervises the growth of films of a required refractive index profile on different substrates including optical fiber ends. It controls the gas flow rates, microwave power, radio frequency substrate bias, and the ECR and extraction magnet power supplies. The system also adjusts the microwave generator to minimize reflected power during deposition. The characteristics of the ECR-PECVD system and the automation of the deposition process are discussed using the growth of a complex rugate optical filter as an example.</description><identifier>ISSN: 0734-2101</identifier><identifier>EISSN: 1520-8559</identifier><identifier>DOI: 10.1116/1.582120</identifier><identifier>CODEN: JVTAD6</identifier><language>eng</language><publisher>American Vacuum Society</publisher><subject>Dielectric materials ; Electron cyclotron resonance ; Engineering Sciences ; Film growth ; Microwave generation ; Optical fibers ; Plasma enhanced chemical vapor deposition ; Refractive index ; Substrates ; Thin films</subject><ispartof>Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2000-01, Vol.18 (1), p.74-78</ispartof><rights>American Vacuum Society</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c359t-48dafa5dbe641850a37b0ebf4ebd5e295fdd2fa1a5f47f1b8869fa7357d7ae8a3</citedby><cites>FETCH-LOGICAL-c359t-48dafa5dbe641850a37b0ebf4ebd5e295fdd2fa1a5f47f1b8869fa7357d7ae8a3</cites><orcidid>0000-0001-5591-3470</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,794,885,4024,4512,27923,27924,27925</link.rule.ids><backlink>$$Uhttps://hal.science/hal-00915351$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Swart, Pieter L.</creatorcontrib><creatorcontrib>Lacquet, Beatrys M.</creatorcontrib><creatorcontrib>Chtcherbakov, Anatoli A.</creatorcontrib><creatorcontrib>Bulkin, Pavel V.</creatorcontrib><title>Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters</title><title>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</title><description>We developed a control system for an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) reactor for the growth of inhomogeneous dielectric thin films for optical applications. The system supervises the growth of films of a required refractive index profile on different substrates including optical fiber ends. It controls the gas flow rates, microwave power, radio frequency substrate bias, and the ECR and extraction magnet power supplies. The system also adjusts the microwave generator to minimize reflected power during deposition. The characteristics of the ECR-PECVD system and the automation of the deposition process are discussed using the growth of a complex rugate optical filter as an example.</description><subject>Dielectric materials</subject><subject>Electron cyclotron resonance</subject><subject>Engineering Sciences</subject><subject>Film growth</subject><subject>Microwave generation</subject><subject>Optical fibers</subject><subject>Plasma enhanced chemical vapor deposition</subject><subject>Refractive index</subject><subject>Substrates</subject><subject>Thin films</subject><issn>0734-2101</issn><issn>1520-8559</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNp9kcGO1DAMhiMEEsOy0j5CbsChS9w2bXocrVgWaSQu7DlyE2dblDYlyQzM22-HQcMBiZPtX59_WzZjNyBuAaD5CLdSlVCKF2wDshSFkrJ7yTaireqiBAGv2ZuUvgshylI0G_Zru89hwkyWkyeTY5i5ORoffmeRUphxNsQXj2lCTvNwKi03A02jQc8PuITILS0hjXlce9IxZZq4W9U8EH-K4WceeHA87p_WOdyNPlNMb9krhz7R9Z94xR7vP327eyh2Xz9_udvuClPJLhe1suhQ2p6aGpQUWLW9oN7V1FtJZSedtaVDQOnq1kGvVNM5bCvZ2hZJYXXFPpx9B_R6ieOE8agDjvphu9MnTYgOZCXhACv77swuMfzYU8p6GpMh73GmsE-6rRtoGlWplXx_Jk0MKUVyF2sQ-vQHDfr8h78LJDNmPJ3owh5CvHB6se5_7D--z0cimNQ</recordid><startdate>200001</startdate><enddate>200001</enddate><creator>Swart, Pieter L.</creator><creator>Lacquet, Beatrys M.</creator><creator>Chtcherbakov, Anatoli A.</creator><creator>Bulkin, Pavel V.</creator><general>American Vacuum Society</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7TC</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0001-5591-3470</orcidid></search><sort><creationdate>200001</creationdate><title>Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters</title><author>Swart, Pieter L. ; Lacquet, Beatrys M. ; Chtcherbakov, Anatoli A. ; Bulkin, Pavel V.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c359t-48dafa5dbe641850a37b0ebf4ebd5e295fdd2fa1a5f47f1b8869fa7357d7ae8a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Dielectric materials</topic><topic>Electron cyclotron resonance</topic><topic>Engineering Sciences</topic><topic>Film growth</topic><topic>Microwave generation</topic><topic>Optical fibers</topic><topic>Plasma enhanced chemical vapor deposition</topic><topic>Refractive index</topic><topic>Substrates</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Swart, Pieter L.</creatorcontrib><creatorcontrib>Lacquet, Beatrys M.</creatorcontrib><creatorcontrib>Chtcherbakov, Anatoli A.</creatorcontrib><creatorcontrib>Bulkin, Pavel V.</creatorcontrib><collection>CrossRef</collection><collection>Mechanical Engineering Abstracts</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Swart, Pieter L.</au><au>Lacquet, Beatrys M.</au><au>Chtcherbakov, Anatoli A.</au><au>Bulkin, Pavel V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters</atitle><jtitle>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</jtitle><date>2000-01</date><risdate>2000</risdate><volume>18</volume><issue>1</issue><spage>74</spage><epage>78</epage><pages>74-78</pages><issn>0734-2101</issn><eissn>1520-8559</eissn><coden>JVTAD6</coden><abstract>We developed a control system for an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) reactor for the growth of inhomogeneous dielectric thin films for optical applications. The system supervises the growth of films of a required refractive index profile on different substrates including optical fiber ends. It controls the gas flow rates, microwave power, radio frequency substrate bias, and the ECR and extraction magnet power supplies. The system also adjusts the microwave generator to minimize reflected power during deposition. The characteristics of the ECR-PECVD system and the automation of the deposition process are discussed using the growth of a complex rugate optical filter as an example.</abstract><pub>American Vacuum Society</pub><doi>10.1116/1.582120</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0001-5591-3470</orcidid></addata></record>
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subjects	Dielectric materials Electron cyclotron resonance Engineering Sciences Film growth Microwave generation Optical fibers Plasma enhanced chemical vapor deposition Refractive index Substrates Thin films
title	Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T22%3A46%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_hal_p&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Automated%20electron%20cyclotron%20resonance%20plasma%20enhanced%20chemical%20vapor%20deposition%20system%20for%20the%20growth%20of%20rugate%20filters&rft.jtitle=Journal%20of%20vacuum%20science%20&%20technology.%20A,%20Vacuum,%20surfaces,%20and%20films&rft.au=Swart,%20Pieter%20L.&rft.date=2000-01&rft.volume=18&rft.issue=1&rft.spage=74&rft.epage=78&rft.pages=74-78&rft.issn=0734-2101&rft.eissn=1520-8559&rft.coden=JVTAD6&rft_id=info:doi/10.1116/1.582120&rft_dat=%3Cproquest_hal_p%3E746166838%3C/proquest_hal_p%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=746166838&rft_id=info:pmid/&rfr_iscdi=true