Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed

Titanium oxide (TiO 2) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibro-fluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH 4). Experimental results show that for the conditions tested, the original granular s...

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Veröffentlicht in:	Powder Technology 2009-03, Vol.190 (1), p.185-191
Hauptverfasser:	Cadoret, L., Reuge, N., Pannala, S., Syamlal, M., Rossignol, C., Dexpert-Ghys, J., Coufort, C., Caussat, B.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemical engineering Chemical Sciences CHEMICAL VAPOR DEPOSITION Chemical Vapor Deposition (CVD) Exact sciences and technology Fluidization Fluidized Bed FLUIDIZED BEDS HYDRODYNAMICS Hydrodynamics of contact apparatus Material chemistry MATERIALS SCIENCE Miscellaneous Process modelling Reactors SILANES SILICON Solid-solid systems Submicron powders TITANIUM OXIDES
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