Fabrication and surface functionalization of high aspect ratio plastic nanostructures

Soft UV nanoimprint lithography and reactive ion etch techniques have been used to pattern high density and high aspect ratio nanostructures on the surface of a plastic plate such as Plexiglas. A thin film of photo-curable resist is first spin coated on the plastic plate, with or without deposition...

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Veröffentlicht in:	Microelectronic engineering 2007-05, Vol.84 (5), p.1724-1728
Hauptverfasser:	Shi, J., Peroz, C., Velve Casquillas, G., Pépin, A., Belotti, M., Xu, L.P., Peyrade, D., Chen, Y.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Nanofabrication Nanoimprint Plastic devices Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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