Electrochemical behaviour of low temperature grown iron fluoride thin films
By coupling a homemade substrate holder with a refrigerated ethanol cryogenic system, we succeeded in growing thin films by Pulsed Laser Deposition at substrate temperatures as low as −50 °C. The benefit of enlarging substrate temperatures to negative values is illustrated through the example of iro...
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Veröffentlicht in: | Electrochemistry communications 2006-11, Vol.8 (11), p.1769-1774 |
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container_title | Electrochemistry communications |
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creator | Makimura, Y. Rougier, A. Laffont, L. Womes, M. Jumas, J.-C. Leriche, J.-B. Tarascon, J.-M. |
description | By coupling a homemade substrate holder with a refrigerated ethanol cryogenic system, we succeeded in growing thin films by Pulsed Laser Deposition at substrate temperatures as low as −50
°C. The benefit of enlarging substrate temperatures to negative values is illustrated through the example of iron fluoride thin films, for which the substrate temperature is a key factor governing the FeF
2 or/and FeF
3 phase deposition. Using a FeF
3 target, the X-ray diffraction study shows that the “FeF
x
” thin films grown at 600
°C correspond to a single well-crystallized FeF
2 phase (S.G.:
P4
2/
mnm) as opposed to a mixture of FeF
3 and FeF
2 phases for room temperature substrate, and a single FeF
3 phase (S.G.:
R
3
¯
c
) having quite an intense (0
1
2) Bragg peak at low temperature substrate (−50
°C). Such assignments were confirmed by complementary HRTEM and Mössbauer measurements with the exception of the −50
°C grown film that was shown to contain amorphous FeF
2 together with crystallized FeF
3 phases. The electrochemical behaviour of the FeF
x
thin films, namely their voltage profiles, was found to be dependent on the substrate grown temperature. |
doi_str_mv | 10.1016/j.elecom.2006.08.004 |
format | Article |
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°C. The benefit of enlarging substrate temperatures to negative values is illustrated through the example of iron fluoride thin films, for which the substrate temperature is a key factor governing the FeF
2 or/and FeF
3 phase deposition. Using a FeF
3 target, the X-ray diffraction study shows that the “FeF
x
” thin films grown at 600
°C correspond to a single well-crystallized FeF
2 phase (S.G.:
P4
2/
mnm) as opposed to a mixture of FeF
3 and FeF
2 phases for room temperature substrate, and a single FeF
3 phase (S.G.:
R
3
¯
c
) having quite an intense (0
1
2) Bragg peak at low temperature substrate (−50
°C). Such assignments were confirmed by complementary HRTEM and Mössbauer measurements with the exception of the −50
°C grown film that was shown to contain amorphous FeF
2 together with crystallized FeF
3 phases. The electrochemical behaviour of the FeF
x
thin films, namely their voltage profiles, was found to be dependent on the substrate grown temperature.</description><identifier>ISSN: 1388-2481</identifier><identifier>EISSN: 1873-1902</identifier><identifier>DOI: 10.1016/j.elecom.2006.08.004</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>57Fe Mössbauer data ; Applied sciences ; Chemical Sciences ; Direct energy conversion and energy accumulation ; Electrical engineering. Electrical power engineering ; Electrical power engineering ; Electrochemical conversion: primary and secondary batteries, fuel cells ; Exact sciences and technology ; Iron fluorides ; Lithium-ion battery ; Low temperature substrate ; Material chemistry ; Pulsed laser deposition ; Thin film</subject><ispartof>Electrochemistry communications, 2006-11, Vol.8 (11), p.1769-1774</ispartof><rights>2006 Elsevier B.V.</rights><rights>2007 INIST-CNRS</rights><rights>Attribution</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c416t-d1d5871a5844b7be8f3587a0ba5537f3c35ce0e4e399b09054d27918341ae52e3</citedby><cites>FETCH-LOGICAL-c416t-d1d5871a5844b7be8f3587a0ba5537f3c35ce0e4e399b09054d27918341ae52e3</cites><orcidid>0000-0002-1340-734X ; 0000-0002-7059-6845 ; 0000-0003-4002-793X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.elecom.2006.08.004$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>230,314,780,784,885,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=18264901$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://hal.science/hal-00353431$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Makimura, Y.</creatorcontrib><creatorcontrib>Rougier, A.</creatorcontrib><creatorcontrib>Laffont, L.</creatorcontrib><creatorcontrib>Womes, M.</creatorcontrib><creatorcontrib>Jumas, J.-C.</creatorcontrib><creatorcontrib>Leriche, J.-B.</creatorcontrib><creatorcontrib>Tarascon, J.-M.</creatorcontrib><title>Electrochemical behaviour of low temperature grown iron fluoride thin films</title><title>Electrochemistry communications</title><description>By coupling a homemade substrate holder with a refrigerated ethanol cryogenic system, we succeeded in growing thin films by Pulsed Laser Deposition at substrate temperatures as low as −50
°C. The benefit of enlarging substrate temperatures to negative values is illustrated through the example of iron fluoride thin films, for which the substrate temperature is a key factor governing the FeF
2 or/and FeF
3 phase deposition. Using a FeF
3 target, the X-ray diffraction study shows that the “FeF
x
” thin films grown at 600
°C correspond to a single well-crystallized FeF
2 phase (S.G.:
P4
2/
mnm) as opposed to a mixture of FeF
3 and FeF
2 phases for room temperature substrate, and a single FeF
3 phase (S.G.:
R
3
¯
c
) having quite an intense (0
1
2) Bragg peak at low temperature substrate (−50
°C). Such assignments were confirmed by complementary HRTEM and Mössbauer measurements with the exception of the −50
°C grown film that was shown to contain amorphous FeF
2 together with crystallized FeF
3 phases. The electrochemical behaviour of the FeF
x
thin films, namely their voltage profiles, was found to be dependent on the substrate grown temperature.</description><subject>57Fe Mössbauer data</subject><subject>Applied sciences</subject><subject>Chemical Sciences</subject><subject>Direct energy conversion and energy accumulation</subject><subject>Electrical engineering. Electrical power engineering</subject><subject>Electrical power engineering</subject><subject>Electrochemical conversion: primary and secondary batteries, fuel cells</subject><subject>Exact sciences and technology</subject><subject>Iron fluorides</subject><subject>Lithium-ion battery</subject><subject>Low temperature substrate</subject><subject>Material chemistry</subject><subject>Pulsed laser deposition</subject><subject>Thin film</subject><issn>1388-2481</issn><issn>1873-1902</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNp9kLFOwzAQhiMEEqXwBgxZGBgSzrGdOAtSVRWKqMQCs-U4F-IqqSs7bcXb4ygINqa7s_7vTv6i6JZASoDkD9sUO9S2TzOAPAWRArCzaEZEQRNSQnYeeipEkjFBLqMr77cAJCtLOoteV4EcnNUt9karLq6wVUdjDy62TdzZUzxgv0enhoPD-NPZ0y42zu7ipjtYZ2qMh9aEyXS9v44uGtV5vPmp8-jjafW-XCebt-eX5WKTaEbyIalJzUVBFBeMVUWFoqFhVlApzmnRUE25RkCGtCwrKIGzOitKIigjCnmGdB7dT3tb1cm9M71yX9IqI9eLjRzfACinjJIjCVk2ZbWz3jtsfgECcpQnt3KSJ0d5EkSgWcDuJmyvfLDSOLXTxv-xIstZCeP6xymH4b9Hg056bXCnsTYueJW1Nf8f-gZ5UYZk</recordid><startdate>20061101</startdate><enddate>20061101</enddate><creator>Makimura, Y.</creator><creator>Rougier, A.</creator><creator>Laffont, L.</creator><creator>Womes, M.</creator><creator>Jumas, J.-C.</creator><creator>Leriche, J.-B.</creator><creator>Tarascon, J.-M.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0002-1340-734X</orcidid><orcidid>https://orcid.org/0000-0002-7059-6845</orcidid><orcidid>https://orcid.org/0000-0003-4002-793X</orcidid></search><sort><creationdate>20061101</creationdate><title>Electrochemical behaviour of low temperature grown iron fluoride thin films</title><author>Makimura, Y. ; Rougier, A. ; Laffont, L. ; Womes, M. ; Jumas, J.-C. ; Leriche, J.-B. ; Tarascon, J.-M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c416t-d1d5871a5844b7be8f3587a0ba5537f3c35ce0e4e399b09054d27918341ae52e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>57Fe Mössbauer data</topic><topic>Applied sciences</topic><topic>Chemical Sciences</topic><topic>Direct energy conversion and energy accumulation</topic><topic>Electrical engineering. Electrical power engineering</topic><topic>Electrical power engineering</topic><topic>Electrochemical conversion: primary and secondary batteries, fuel cells</topic><topic>Exact sciences and technology</topic><topic>Iron fluorides</topic><topic>Lithium-ion battery</topic><topic>Low temperature substrate</topic><topic>Material chemistry</topic><topic>Pulsed laser deposition</topic><topic>Thin film</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Makimura, Y.</creatorcontrib><creatorcontrib>Rougier, A.</creatorcontrib><creatorcontrib>Laffont, L.</creatorcontrib><creatorcontrib>Womes, M.</creatorcontrib><creatorcontrib>Jumas, J.-C.</creatorcontrib><creatorcontrib>Leriche, J.-B.</creatorcontrib><creatorcontrib>Tarascon, J.-M.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>Electrochemistry communications</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Makimura, Y.</au><au>Rougier, A.</au><au>Laffont, L.</au><au>Womes, M.</au><au>Jumas, J.-C.</au><au>Leriche, J.-B.</au><au>Tarascon, J.-M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrochemical behaviour of low temperature grown iron fluoride thin films</atitle><jtitle>Electrochemistry communications</jtitle><date>2006-11-01</date><risdate>2006</risdate><volume>8</volume><issue>11</issue><spage>1769</spage><epage>1774</epage><pages>1769-1774</pages><issn>1388-2481</issn><eissn>1873-1902</eissn><abstract>By coupling a homemade substrate holder with a refrigerated ethanol cryogenic system, we succeeded in growing thin films by Pulsed Laser Deposition at substrate temperatures as low as −50
°C. The benefit of enlarging substrate temperatures to negative values is illustrated through the example of iron fluoride thin films, for which the substrate temperature is a key factor governing the FeF
2 or/and FeF
3 phase deposition. Using a FeF
3 target, the X-ray diffraction study shows that the “FeF
x
” thin films grown at 600
°C correspond to a single well-crystallized FeF
2 phase (S.G.:
P4
2/
mnm) as opposed to a mixture of FeF
3 and FeF
2 phases for room temperature substrate, and a single FeF
3 phase (S.G.:
R
3
¯
c
) having quite an intense (0
1
2) Bragg peak at low temperature substrate (−50
°C). Such assignments were confirmed by complementary HRTEM and Mössbauer measurements with the exception of the −50
°C grown film that was shown to contain amorphous FeF
2 together with crystallized FeF
3 phases. The electrochemical behaviour of the FeF
x
thin films, namely their voltage profiles, was found to be dependent on the substrate grown temperature.</abstract><cop>Lausanne</cop><cop>Amsterdam</cop><cop>New York, NY</cop><pub>Elsevier B.V</pub><doi>10.1016/j.elecom.2006.08.004</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-1340-734X</orcidid><orcidid>https://orcid.org/0000-0002-7059-6845</orcidid><orcidid>https://orcid.org/0000-0003-4002-793X</orcidid><oa>free_for_read</oa></addata></record> |
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source | Elsevier ScienceDirect Journals Complete |
subjects | 57Fe Mössbauer data Applied sciences Chemical Sciences Direct energy conversion and energy accumulation Electrical engineering. Electrical power engineering Electrical power engineering Electrochemical conversion: primary and secondary batteries, fuel cells Exact sciences and technology Iron fluorides Lithium-ion battery Low temperature substrate Material chemistry Pulsed laser deposition Thin film |
title | Electrochemical behaviour of low temperature grown iron fluoride thin films |
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