Current Induced Potential Well in Compensated Semiconductors
To obtain high resistivity samples in the case of III‐V compounds such as GaAs or InP, deep levels are often used as compensating centers for residual shallow dopants. These levels usually have very different capture cross sections for electrons (σn) and holes (σp). We consider here a GaAs P+‐semi‐i...
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Veröffentlicht in: | Physica status solidi. A, Applications and materials science Applications and materials science, 1996-11, Vol.158 (1), p.137-142 |
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