Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS
The present paper reports the XPS study of different high sulfur content amorphous oxysulfides thin films MOySz (M=W, Ti), prepared by radio frequency magnetron sputtering in a pure argon or mixed oxygen/argon plasma. Two types of thin layers are analyzed in this work, synthesized with an oxygen par...
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| Veröffentlicht in: | Applied surface science 2004-09, Vol.236 (1-4), p.377-386 |
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| creator | Martinez, H. Benayad, A. Gonbeau, D. Vinatier, P. Pecquenard, B. Levasseur, A. |
| description | The present paper reports the XPS study of different high sulfur content amorphous oxysulfides thin films MOySz (M=W, Ti), prepared by radio frequency magnetron sputtering in a pure argon or mixed oxygen/argon plasma. Two types of thin layers are analyzed in this work, synthesized with an oxygen partial pressure equal to 0 and 2×10−4Pa. On the basis of both core peaks and valence bands, several types of sulfur ions were observed and revealed the specific character of such amorphous layers. In order to precise the common features and the differences as a function of the nature of the metal atom, a comparison of the XPS data for the two kinds of thin films has been done. The results are also commented with respect to theoretical calculations (FP-LAPW—code WIEN97) undertaken on crystallized reference compounds. |
| doi_str_mv | 10.1016/j.apsusc.2004.05.010 |
| format | Article |
| fullrecord | <record><control><sourceid>hal_pasca</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_00150342v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0169433204006075</els_id><sourcerecordid>oai_HAL_hal_00150342v1</sourcerecordid><originalsourceid>FETCH-LOGICAL-e204t-9deef1da1cfeb0d5433dd6d2c92019ac30263458af9afa1dabb1abf82be878c73</originalsourceid><addsrcrecordid>eNo9kU9Lw0AQxRdRsFa_gYe9CBZMnN1N2uSgUIraQkuFVvS2bPaP3ZImJZsU46d3Y8XTwJvfG2bmIXRNICRAhvfbUOxd42RIAaIQ4hAInKAeSUYsiOMkOkU9j6VBxBg9RxfObQEI9d0e2s4Kkze6kBqXBtcbjaWobVngQtRN9Stu7OcGuyY3TYVlWdS6qHH51XaKVdp7bIGNzXcOL5bt6hvfLh7e7_DaDrCrG2W1wlmLP15Xl-jMiNzpq7_aR2_PT-vJNJgvX2aT8TzQFKI6SJXWhihBpNEZqNgvrdRQUZlSIKmQDOiQRXEiTCqM8GCWEZGZhGY6GSVyxPpocJy7ETnfV3YnqpaXwvLpeM47zR8fA4vogXj25sjuhZMiN5UopHX_LjIkAKOEee7xyGm_-MHqijtpu68pW2lZc1VaToB3afAtP6bBuzQ4xNynwX4Arh6AWw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS</title><source>Access via ScienceDirect (Elsevier)</source><creator>Martinez, H. ; Benayad, A. ; Gonbeau, D. ; Vinatier, P. ; Pecquenard, B. ; Levasseur, A.</creator><creatorcontrib>Martinez, H. ; Benayad, A. ; Gonbeau, D. ; Vinatier, P. ; Pecquenard, B. ; Levasseur, A.</creatorcontrib><description>The present paper reports the XPS study of different high sulfur content amorphous oxysulfides thin films MOySz (M=W, Ti), prepared by radio frequency magnetron sputtering in a pure argon or mixed oxygen/argon plasma. Two types of thin layers are analyzed in this work, synthesized with an oxygen partial pressure equal to 0 and 2×10−4Pa. On the basis of both core peaks and valence bands, several types of sulfur ions were observed and revealed the specific character of such amorphous layers. In order to precise the common features and the differences as a function of the nature of the metal atom, a comparison of the XPS data for the two kinds of thin films has been done. The results are also commented with respect to theoretical calculations (FP-LAPW—code WIEN97) undertaken on crystallized reference compounds.</description><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><identifier>DOI: 10.1016/j.apsusc.2004.05.010</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Chemical Sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Core peaks ; Cross-disciplinary physics: materials science; rheology ; Density of states ; Exact sciences and technology ; Material chemistry ; Physics ; Thin films ; Titanium oxysulfide ; Tungsten oxysulfide ; Valence bands ; XPS</subject><ispartof>Applied surface science, 2004-09, Vol.236 (1-4), p.377-386</ispartof><rights>2004 Elsevier B.V.</rights><rights>2005 INIST-CNRS</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0002-8717-119X ; 0000-0002-6621-199X ; 0000-0002-9240-3098</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.apsusc.2004.05.010$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>230,315,782,786,887,3552,27931,27932,46002</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16100783$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://hal.science/hal-00150342$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Martinez, H.</creatorcontrib><creatorcontrib>Benayad, A.</creatorcontrib><creatorcontrib>Gonbeau, D.</creatorcontrib><creatorcontrib>Vinatier, P.</creatorcontrib><creatorcontrib>Pecquenard, B.</creatorcontrib><creatorcontrib>Levasseur, A.</creatorcontrib><title>Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS</title><title>Applied surface science</title><description>The present paper reports the XPS study of different high sulfur content amorphous oxysulfides thin films MOySz (M=W, Ti), prepared by radio frequency magnetron sputtering in a pure argon or mixed oxygen/argon plasma. Two types of thin layers are analyzed in this work, synthesized with an oxygen partial pressure equal to 0 and 2×10−4Pa. On the basis of both core peaks and valence bands, several types of sulfur ions were observed and revealed the specific character of such amorphous layers. In order to precise the common features and the differences as a function of the nature of the metal atom, a comparison of the XPS data for the two kinds of thin films has been done. The results are also commented with respect to theoretical calculations (FP-LAPW—code WIEN97) undertaken on crystallized reference compounds.</description><subject>Chemical Sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Core peaks</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Density of states</subject><subject>Exact sciences and technology</subject><subject>Material chemistry</subject><subject>Physics</subject><subject>Thin films</subject><subject>Titanium oxysulfide</subject><subject>Tungsten oxysulfide</subject><subject>Valence bands</subject><subject>XPS</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNo9kU9Lw0AQxRdRsFa_gYe9CBZMnN1N2uSgUIraQkuFVvS2bPaP3ZImJZsU46d3Y8XTwJvfG2bmIXRNICRAhvfbUOxd42RIAaIQ4hAInKAeSUYsiOMkOkU9j6VBxBg9RxfObQEI9d0e2s4Kkze6kBqXBtcbjaWobVngQtRN9Stu7OcGuyY3TYVlWdS6qHH51XaKVdp7bIGNzXcOL5bt6hvfLh7e7_DaDrCrG2W1wlmLP15Xl-jMiNzpq7_aR2_PT-vJNJgvX2aT8TzQFKI6SJXWhihBpNEZqNgvrdRQUZlSIKmQDOiQRXEiTCqM8GCWEZGZhGY6GSVyxPpocJy7ETnfV3YnqpaXwvLpeM47zR8fA4vogXj25sjuhZMiN5UopHX_LjIkAKOEee7xyGm_-MHqijtpu68pW2lZc1VaToB3afAtP6bBuzQ4xNynwX4Arh6AWw</recordid><startdate>20040915</startdate><enddate>20040915</enddate><creator>Martinez, H.</creator><creator>Benayad, A.</creator><creator>Gonbeau, D.</creator><creator>Vinatier, P.</creator><creator>Pecquenard, B.</creator><creator>Levasseur, A.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><general>Elsevier</general><scope>IQODW</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0002-8717-119X</orcidid><orcidid>https://orcid.org/0000-0002-6621-199X</orcidid><orcidid>https://orcid.org/0000-0002-9240-3098</orcidid></search><sort><creationdate>20040915</creationdate><title>Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS</title><author>Martinez, H. ; Benayad, A. ; Gonbeau, D. ; Vinatier, P. ; Pecquenard, B. ; Levasseur, A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-e204t-9deef1da1cfeb0d5433dd6d2c92019ac30263458af9afa1dabb1abf82be878c73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Chemical Sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Core peaks</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Density of states</topic><topic>Exact sciences and technology</topic><topic>Material chemistry</topic><topic>Physics</topic><topic>Thin films</topic><topic>Titanium oxysulfide</topic><topic>Tungsten oxysulfide</topic><topic>Valence bands</topic><topic>XPS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Martinez, H.</creatorcontrib><creatorcontrib>Benayad, A.</creatorcontrib><creatorcontrib>Gonbeau, D.</creatorcontrib><creatorcontrib>Vinatier, P.</creatorcontrib><creatorcontrib>Pecquenard, B.</creatorcontrib><creatorcontrib>Levasseur, A.</creatorcontrib><collection>Pascal-Francis</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Martinez, H.</au><au>Benayad, A.</au><au>Gonbeau, D.</au><au>Vinatier, P.</au><au>Pecquenard, B.</au><au>Levasseur, A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS</atitle><jtitle>Applied surface science</jtitle><date>2004-09-15</date><risdate>2004</risdate><volume>236</volume><issue>1-4</issue><spage>377</spage><epage>386</epage><pages>377-386</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><abstract>The present paper reports the XPS study of different high sulfur content amorphous oxysulfides thin films MOySz (M=W, Ti), prepared by radio frequency magnetron sputtering in a pure argon or mixed oxygen/argon plasma. Two types of thin layers are analyzed in this work, synthesized with an oxygen partial pressure equal to 0 and 2×10−4Pa. On the basis of both core peaks and valence bands, several types of sulfur ions were observed and revealed the specific character of such amorphous layers. In order to precise the common features and the differences as a function of the nature of the metal atom, a comparison of the XPS data for the two kinds of thin films has been done. The results are also commented with respect to theoretical calculations (FP-LAPW—code WIEN97) undertaken on crystallized reference compounds.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2004.05.010</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0002-8717-119X</orcidid><orcidid>https://orcid.org/0000-0002-6621-199X</orcidid><orcidid>https://orcid.org/0000-0002-9240-3098</orcidid></addata></record> |
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| ispartof | Applied surface science, 2004-09, Vol.236 (1-4), p.377-386 |
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| source | Access via ScienceDirect (Elsevier) |
| subjects | Chemical Sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Core peaks Cross-disciplinary physics: materials science rheology Density of states Exact sciences and technology Material chemistry Physics Thin films Titanium oxysulfide Tungsten oxysulfide Valence bands XPS |
| title | Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-04T14%3A39%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Influence%20of%20the%20cation%20nature%20of%20high%20sulfur%20content%20oxysulfide%20thin%20films%20MOySz%20(M=W,%20Ti)%20studied%20by%20XPS&rft.jtitle=Applied%20surface%20science&rft.au=Martinez,%20H.&rft.date=2004-09-15&rft.volume=236&rft.issue=1-4&rft.spage=377&rft.epage=386&rft.pages=377-386&rft.issn=0169-4332&rft.eissn=1873-5584&rft_id=info:doi/10.1016/j.apsusc.2004.05.010&rft_dat=%3Chal_pasca%3Eoai_HAL_hal_00150342v1%3C/hal_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_els_id=S0169433204006075&rfr_iscdi=true |