Structural and optical properties of vapour-etching based porous silicon
The structural and optical properties of porous silicon (PS) layers prepared by Vapour‐Etching (VE) of moderately and heavily boron‐doped Si substrates are investigated. The VE technique produces rough PS layers that are essentially formed of interconnected cluster‐like structures. Optical investiga...
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Veröffentlicht in: | Crystal research and technology (1979) 2006-02, Vol.41 (2), p.154-162 |
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Format: | Artikel |
Sprache: | eng |
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