Sintering of nanocrystalline Ta2O5 and ZrO2 films compared to that of TiO2 films
Thin (d = 60 nm/140 nm) nanocrystalline Ta2O5 and ZrO2 films were deposited onto SiO2 flakes, using a liquid synthesis route. Their sintering behaviour was characterised and compared to that of the corresponding powders and the known equivalent TiO2 film in terms of grain size, grain growth and laye...
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Veröffentlicht in: | Journal of the European Ceramic Society 2006, Vol.26 (6), p.923-932 |
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creator | BERTAUX, Stéphane REYNDERS, Peter HEINTZ, Jean-Marc |
description | Thin (d = 60 nm/140 nm) nanocrystalline Ta2O5 and ZrO2 films were deposited onto SiO2 flakes, using a liquid synthesis route. Their sintering behaviour was characterised and compared to that of the corresponding powders and the known equivalent TiO2 film in terms of grain size, grain growth and layer porosity. The substrate had a noticeable effect on crystallisation but not on grain growth. The sintering behaviour was actually dictated by the initial size and packing of the precipitated grains related to the synthesis of the film. 47 refs. |
doi_str_mv | 10.1016/j.jeurceramsoc.2004.11.019 |
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Their sintering behaviour was characterised and compared to that of the corresponding powders and the known equivalent TiO2 film in terms of grain size, grain growth and layer porosity. The substrate had a noticeable effect on crystallisation but not on grain growth. The sintering behaviour was actually dictated by the initial size and packing of the precipitated grains related to the synthesis of the film. 47 refs.</description><identifier>ISSN: 0955-2219</identifier><identifier>EISSN: 1873-619X</identifier><identifier>DOI: 10.1016/j.jeurceramsoc.2004.11.019</identifier><language>eng</language><publisher>Oxford: Elsevier</publisher><subject>Applied sciences ; Building materials. Ceramics. 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Glasses</subject><subject>Ceramic industries</subject><subject>Chemical industry and chemicals</subject><subject>Chemical Sciences</subject><subject>Exact sciences and technology</subject><subject>Material chemistry</subject><subject>Miscellaneous</subject><subject>Technical ceramics</subject><issn>0955-2219</issn><issn>1873-619X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNqNkVFrFDEUhYMouFb_QxAUfJhp7k0yk_hWilphYQW3UHwJ2Uxis8xM1mRW6L93hq3Wt_bpQu53Tk5yCHkLrAYGzfm-3vtjdj7boSRXI2OiBqgZ6GdkBarlVQP65jlZMS1lhQj6JXlVyp4xaJnWK_Ltexwnn-P4k6ZARzsml-_KZPs-jp5uLW4ktWNHf-QN0hD7oVCXhoPNvqNTotOtnRbhNv5dvyYvgu2Lf3M_z8j150_by6tqvfny9fJiXTmBbKqQN-ilVFwo3okdgx3XLjStRscDFzupAkepNFMS1ZxVtDagFkx3zkHXSX5GPpx8b21vDjkONt-ZZKO5ulib5YzNb9TI8TfM7PsTe8jp19GXyQyxON_3dvTpWAzqBpni8nGw1UoIqZ8CNkrh4vjxBLqcSsk-_MsKzCwVmr35v0KzVGgAzBx-Fr-7v8UWZ_uQ7ehieXBo5fyXDfA_-xKdhg</recordid><startdate>2006</startdate><enddate>2006</enddate><creator>BERTAUX, Stéphane</creator><creator>REYNDERS, Peter</creator><creator>HEINTZ, Jean-Marc</creator><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope><scope>7QQ</scope><scope>7TB</scope><scope>FR3</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0002-1082-5714</orcidid></search><sort><creationdate>2006</creationdate><title>Sintering of nanocrystalline Ta2O5 and ZrO2 films compared to that of TiO2 films</title><author>BERTAUX, Stéphane ; REYNDERS, Peter ; HEINTZ, Jean-Marc</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c420t-2362e5583483d4b01b39cf6792c3f34b58f325890852817047af29409dcc1dd53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Applied sciences</topic><topic>Building materials. 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source | Elsevier ScienceDirect Journals |
subjects | Applied sciences Building materials. Ceramics. Glasses Ceramic industries Chemical industry and chemicals Chemical Sciences Exact sciences and technology Material chemistry Miscellaneous Technical ceramics |
title | Sintering of nanocrystalline Ta2O5 and ZrO2 films compared to that of TiO2 films |
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