Atomic Layer Deposition of a High-Density Aminopropylsiloxane Network on Silica through Sequential Reactions of γ-Aminopropyltrialkoxysilanes and Water

A novel gas-phase procedure for the control of amino group density on porous silica through consecutive reactions of aminopropylalkoxysilanes and water vapor was developed. First heat-treated silica was saturated with trifunctional γ-aminopropyltrimethoxysilane (APTMS) or γ-aminopropyltriethoxysilan...

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Veröffentlicht in:Langmuir 2003-12, Vol.19 (25), p.10601-10609
Hauptverfasser: Ek, Satu, Iiskola, Eero I, Niinistö, Lauri, Vaittinen, Jari, Pakkanen, Tuula T, Keränen, Jetta, Auroux, Aline
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Sprache:eng
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