Phosphorus emitter engineering by plasma-immersion ion implantation for c-Si solar cells

Ion Beam Services (IBS) has developed processes dedicated to silicon-based solar cell manufacturing using a plasma-immersion ion implantation equipment. It enables the realization of various doping profiles for phosphorus-doped emitters which fit the requirements of high-efficiency solar cells. PH3...

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Veröffentlicht in:	Solar energy materials and solar cells 2015-02, Vol.133, p.194-200
Hauptverfasser:	Michel, Thomas, Le Perchec, Jérôme, Lanterne, Adeline, Monna, Rémi, Torregrosa, Frank, Roux, Laurent, Commandré, Mireille
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Crystalline silicon Doping Double layer Electric power Emittance Engineering Sciences INES (sat nav sys) Ion implantation Materials Micro and nanotechnologies Microelectronics Optics Photonic Photovoltaic cells Photovoltaics Plasma-immersion Solar cell Solar cells Solar energy
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