Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin films

A side effect of magnetron sputtering is the production of neutral working gas atoms backscattered from the cathode. Their influence on the morphology of sputter-deposited thin films, though, is usually neglected, which may not always be justified. In particular, for high-power impulse magnetron spu...

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Veröffentlicht in:	Thin solid films 2018-07, Vol.658, p.46-53
Hauptverfasser:	Rudolph, Martin, Lundin, Daniel, Foy, Eddy, Debongnie, Mathieu, Hugon, Marie-Christine, Minea, Tiberiu
Format:	Artikel
Sprache:	eng
Schlagworte:	Backscattered neutrals Chemical Sciences Grain size High power impulse magnetron sputtering Magnetron sputtering Material chemistry Ta3N5 Tantalum nitride Thin film morphology
Online-Zugang:	Volltext
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