Shuffling atomic layer deposition gas sequences to modulate bimetallic thin films and nanoparticle properties

Atomic layer deposition (ALD) typically employs metal precursor and co-reactant pulses to deposit thin films in a layer-by-layer fashion. While conventional ABAB-type ALD sequences implement only two functionalities, namely a metal source and ligand exchange agent, additional functionalities have em...

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Hauptverfasser:	Filez, Matthias, Feng, Ji-Yu, Minjauw, Matthias, Solano Minuesa, Eduardo, Poonkottil, Nithin, Van Daele, Michiel, Karuparambil Ramachandran, Ranjith, Li, Chen, Bals, Sara, Poelman, Hilde, Detavernier, Christophe, Dendooven, Jolien
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry General Chemical Engineering General Chemistry Materials Chemistry Physics and Astronomy
Online-Zugang:	Volltext
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