A Novel Approach for Fabricating LaMN[O.sub.3] Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques

LaMn[O.sub.3] (LMO) nanopowder was synthesized by the microwave combustion method using glycine and nitrate salts of La and Mn as precursors. The as-prepared LMO powder was pressed at high pressure and annealed at 1000[degrees]C for 8 hours to make a target for thin film deposition. The structural a...

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Veröffentlicht in:Journal of chemistry 2019-03, Vol.2019
Hauptverfasser: Tran, Thi Ha, Tang, Thi Trung Anh, Pham, Nguyen Hai, Bach, Thanh Cong, Sai, Cong Doanh, Nguyen, Quang Hoa, Le, Van Vu, Nguyen, Hoang Nam, Doan, Quoc Khoa, Nguyen, Trong Tam, Le, Viet Bau, Ho, Khac Hieu, Nguyen, Viet Tuyen
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container_title Journal of chemistry
container_volume 2019
creator Tran, Thi Ha
Tang, Thi Trung Anh
Pham, Nguyen Hai
Bach, Thanh Cong
Sai, Cong Doanh
Nguyen, Quang Hoa
Le, Van Vu
Nguyen, Hoang Nam
Doan, Quoc Khoa
Nguyen, Trong Tam
Le, Viet Bau
Ho, Khac Hieu
Nguyen, Viet Tuyen
description LaMn[O.sub.3] (LMO) nanopowder was synthesized by the microwave combustion method using glycine and nitrate salts of La and Mn as precursors. The as-prepared LMO powder was pressed at high pressure and annealed at 1000[degrees]C for 8 hours to make a target for thin film deposition. The structural and elemental analysis was obtained by X-ray diffraction (XRD) and energy dispersive X-ray spectroscopy (EDS). Thin films of LMO were fabricated using pulsed electron deposition (PED) at room temperature. The effects of discharge voltage and oxygen/argon flux ratio on the produced thin films were studied. The study shows that stoichiometry and structure of the target was preserved well in the thin films prepared with a discharge voltage from 14 to 15 kV, while the oxygen/ nitrogen flux ratio did not show a clear effect on the quality of thin films.
doi_str_mv 10.1155/2019/3568185
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subjects Analysis
Combustion
Dielectric films
Diffraction
Glycine
Methods
Thin films
X-ray spectroscopy
X-rays
title A Novel Approach for Fabricating LaMN[O.sub.3] Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques
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