Effect of the processes in the laser ablation plume on the resistivity and morphology of nanocrystalline ZnO films

The specific features of the formation of nanocrystalline ZnO films by pulsed laser deposition have been studied at different target–substrate distances. Expressions for estimating the temperature, particle concentration, and pressure in the laser ablation plume have been obtained. The effect of these parameters on electrical properties of nanocrystalline ZnO films grown by pulsed laser deposition has been estimated. The feasibility of the controlled growth of nanocrystalline ZnO films with a surface roughness of ~2–15 nm, grain diameters of 70–620 nm, and resistivities in the range of (1.75–5.3) × 10 –3 Ω cm has been demonstrated.