Using high resolution and dynamic reaction cell for the improvement of the sensitivity of direct silicon determination in uranium materials by inductively coupled plasma mass spectrometry

The paper describes solving the problem of direct silicon determination at low levels in uranium materials, caused by the spectral interferences of polyatomic ions and the high value of blank levels, using inductively coupled plasma mass spectrometry ( ICP MS ). To overcome the interference problem,...

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Veröffentlicht in:	Journal of analytical chemistry (New York, N.Y.) N.Y.), 2013-12, Vol.68 (13), p.1142-1150
Hauptverfasser:	Golik, V. M., Kuz’mina, N. V., Saprygin, A. V., Trepachev, S. A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Analytical Chemistry Chemical research Chemistry Chemistry and Materials Science Electromagnetic interference Identification and classification Mass spectrometry Methods Silicon
Online-Zugang:	Volltext
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