193-nm lithographic system lifetimes as limited by UV compaction
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| Veröffentlicht in: | Solid state technology 1997-04, Vol.40 (4), p.95-102 |
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| Hauptverfasser: | , |
| Format: | Magazinearticle |
| Sprache: | eng |
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| container_end_page | 102 |
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| container_issue | 4 |
| container_start_page | 95 |
| container_title | Solid state technology |
| container_volume | 40 |
| creator | OLDHAM, W. G SCHENKER, R. E |
| description | |
| format | Magazinearticle |
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| fulltext | fulltext |
| identifier | ISSN: 0038-111X |
| ispartof | Solid state technology, 1997-04, Vol.40 (4), p.95-102 |
| issn | 0038-111X |
| language | eng |
| recordid | cdi_gale_infotracmisc_A19420784 |
| source | Business Source Complete |
| subjects | Analysis Applied sciences Electronics Exact sciences and technology Innovations Integrated circuit fabrication Lithography Microelectronic fabrication (materials and surfaces technology) Photolithography Printing Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| title | 193-nm lithographic system lifetimes as limited by UV compaction |
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