Effects of β-Si[sub.3]N[sub.4] Seeds on Microstructure and Performance of Si[sub.3]N[sub.4] Ceramics in Semiconductor Package

Among the various ceramic substrate materials, Si[sub.3]N[sub.4] ceramics have demonstrated high thermal conductivity, good thermal shock resistance, and excellent corrosion resistance. As a result, they are well-suited for semiconductor substrates in high-power and harsh conditions encountered in a...

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Veröffentlicht in:Materials 2023-06, Vol.16 (12)
Hauptverfasser: Shen, Qiang, Lin, Zhijie, Deng, Junjie, Chen, Hongxiang, Chen, Xuan, Tian, Jun, Bao, Biliang, Dai, Pinqiang, Sun, Xudong
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Sprache:eng
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Zusammenfassung:Among the various ceramic substrate materials, Si[sub.3]N[sub.4] ceramics have demonstrated high thermal conductivity, good thermal shock resistance, and excellent corrosion resistance. As a result, they are well-suited for semiconductor substrates in high-power and harsh conditions encountered in automobiles, high-speed rail, aerospace, and wind power. In this work, Si[sub.3]N[sub.4] ceramics with various ratios of α-Si[sub.3]N[sub.4] and β-Si[sub.3]N[sub.4] in raw powder form were prepared by spark plasma sintering (SPS) at 1650 °C for 30 min under 30 MPa. When the content of β-Si[sub.3]N[sub.4] was lower than 20%, with the increase in β-Si[sub.3]N[sub.4] content, the ceramic grain size changed gradually from 1.5 μm to 1 μm and finally resulted in 2 μm mixed grains. However, As the content of β-Si[sub.3]N[sub.4] seed crystal increased from 20% to 50%, with the increase in β-Si[sub.3]N[sub.4] content, the ceramic grain size changed gradually from 1 μm and 2 μm to 1.5 μm. Therefore, when the content of β-Si[sub.3]N[sub.4] in the raw powder is 20%, the sintered ceramics exhibited a double-peak structure distribution and the best overall performance with a density of 97.5%, fracture toughness of 12.1 MPa·m[sup.1/2], and a Vickers hardness of 14.5 GPa. The results of this study are expected to provide a new way of studying the fracture toughness of silicon nitride ceramic substrates.
ISSN:1996-1944
1996-1944
DOI:10.3390/ma16124461