Simulation of the [beta]-Voltaic Effect in Silicon pin Structures Irradiated with Electrons From a Nickel-63 [beta] Source

The prospects of [beta] voltaics as electric-power sources for semiconductor circuits are considered. Experimental studies show that charging of the surface and a decrease in the electrovoltaic power are important. Simulation of the [beta]-voltaic effect induced by electrons from a nickel-63 source...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2016-01, Vol.50 (1), p.16
Hauptverfasser: Nagornov, Yu.S, Murashev, V.N
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description The prospects of [beta] voltaics as electric-power sources for semiconductor circuits are considered. Experimental studies show that charging of the surface and a decrease in the electrovoltaic power are important. Simulation of the [beta]-voltaic effect induced by electrons from a nickel-63 source on silicon pin structures is performed; it is shown that the coefficient of the collection of generated charge carriers can be as high as 13%. The dose dependences of the performance efficiency of silicon [beta]- voltaic structures are determined for the case of irradiation with a particles and [gamma]-ray photons; it is shown that 1.3 x [10.sup.14] and [10.sup.20] [cm.sup.-2], respectively, are the threshold doses, above which a rapid decrease in efficiency occurs. The optimal parameters of microchannel structures in [beta]-voltaic electronics, in which the width of the channels and the distance between them correspond to 3 and 10 [micro]m, are determined. DOI: 10.1134/S1063782616010188
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fullrecord <record><control><sourceid>gale</sourceid><recordid>TN_cdi_gale_infotracacademiconefile_A539035076</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><galeid>A539035076</galeid><sourcerecordid>A539035076</sourcerecordid><originalsourceid>FETCH-gale_infotracacademiconefile_A5390350763</originalsourceid><addsrcrecordid>eNqVjU1OxDAMRrMAieHnAOx8gQ4JmWbKEqGOYMOmiA1CyKQOY0gblLhC4vS00lwAfQt_enq2lbo0em2M3Vx1Rju7ba6dcdpo0zRHarWgamEn6rSUT62NaerNSv12PEwRhdMIKYDsCV7eSfC1ek5RkD20IZAX4BE6juxn73vpkicvU6YCDzljzyjUww_LHto4-zmNBXY5DYDwyP6LYuXs4TR0acqeztVxwFjo4jDP1HrXPt3dVx8Y6Y3HkCSjn9PTsPylwDO_re2NtrXeOvvvhT_XT1pC</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Simulation of the [beta]-Voltaic Effect in Silicon pin Structures Irradiated with Electrons From a Nickel-63 [beta] Source</title><source>SpringerLink Journals - AutoHoldings</source><creator>Nagornov, Yu.S ; Murashev, V.N</creator><creatorcontrib>Nagornov, Yu.S ; Murashev, V.N</creatorcontrib><description>The prospects of [beta] voltaics as electric-power sources for semiconductor circuits are considered. Experimental studies show that charging of the surface and a decrease in the electrovoltaic power are important. Simulation of the [beta]-voltaic effect induced by electrons from a nickel-63 source on silicon pin structures is performed; it is shown that the coefficient of the collection of generated charge carriers can be as high as 13%. The dose dependences of the performance efficiency of silicon [beta]- voltaic structures are determined for the case of irradiation with a particles and [gamma]-ray photons; it is shown that 1.3 x [10.sup.14] and [10.sup.20] [cm.sup.-2], respectively, are the threshold doses, above which a rapid decrease in efficiency occurs. The optimal parameters of microchannel structures in [beta]-voltaic electronics, in which the width of the channels and the distance between them correspond to 3 and 10 [micro]m, are determined. DOI: 10.1134/S1063782616010188</description><identifier>ISSN: 1063-7826</identifier><identifier>DOI: 10.1134/S1063782616010188</identifier><language>eng</language><publisher>Springer</publisher><subject>Electrons ; Silicon</subject><ispartof>Semiconductors (Woodbury, N.Y.), 2016-01, Vol.50 (1), p.16</ispartof><rights>COPYRIGHT 2016 Springer</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Nagornov, Yu.S</creatorcontrib><creatorcontrib>Murashev, V.N</creatorcontrib><title>Simulation of the [beta]-Voltaic Effect in Silicon pin Structures Irradiated with Electrons From a Nickel-63 [beta] Source</title><title>Semiconductors (Woodbury, N.Y.)</title><description>The prospects of [beta] voltaics as electric-power sources for semiconductor circuits are considered. Experimental studies show that charging of the surface and a decrease in the electrovoltaic power are important. Simulation of the [beta]-voltaic effect induced by electrons from a nickel-63 source on silicon pin structures is performed; it is shown that the coefficient of the collection of generated charge carriers can be as high as 13%. The dose dependences of the performance efficiency of silicon [beta]- voltaic structures are determined for the case of irradiation with a particles and [gamma]-ray photons; it is shown that 1.3 x [10.sup.14] and [10.sup.20] [cm.sup.-2], respectively, are the threshold doses, above which a rapid decrease in efficiency occurs. The optimal parameters of microchannel structures in [beta]-voltaic electronics, in which the width of the channels and the distance between them correspond to 3 and 10 [micro]m, are determined. DOI: 10.1134/S1063782616010188</description><subject>Electrons</subject><subject>Silicon</subject><issn>1063-7826</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><sourceid/><recordid>eNqVjU1OxDAMRrMAieHnAOx8gQ4JmWbKEqGOYMOmiA1CyKQOY0gblLhC4vS00lwAfQt_enq2lbo0em2M3Vx1Rju7ba6dcdpo0zRHarWgamEn6rSUT62NaerNSv12PEwRhdMIKYDsCV7eSfC1ek5RkD20IZAX4BE6juxn73vpkicvU6YCDzljzyjUww_LHto4-zmNBXY5DYDwyP6LYuXs4TR0acqeztVxwFjo4jDP1HrXPt3dVx8Y6Y3HkCSjn9PTsPylwDO_re2NtrXeOvvvhT_XT1pC</recordid><startdate>20160101</startdate><enddate>20160101</enddate><creator>Nagornov, Yu.S</creator><creator>Murashev, V.N</creator><general>Springer</general><scope/></search><sort><creationdate>20160101</creationdate><title>Simulation of the [beta]-Voltaic Effect in Silicon pin Structures Irradiated with Electrons From a Nickel-63 [beta] Source</title><author>Nagornov, Yu.S ; Murashev, V.N</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-gale_infotracacademiconefile_A5390350763</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Electrons</topic><topic>Silicon</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Nagornov, Yu.S</creatorcontrib><creatorcontrib>Murashev, V.N</creatorcontrib><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nagornov, Yu.S</au><au>Murashev, V.N</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Simulation of the [beta]-Voltaic Effect in Silicon pin Structures Irradiated with Electrons From a Nickel-63 [beta] Source</atitle><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle><date>2016-01-01</date><risdate>2016</risdate><volume>50</volume><issue>1</issue><spage>16</spage><pages>16-</pages><issn>1063-7826</issn><abstract>The prospects of [beta] voltaics as electric-power sources for semiconductor circuits are considered. Experimental studies show that charging of the surface and a decrease in the electrovoltaic power are important. Simulation of the [beta]-voltaic effect induced by electrons from a nickel-63 source on silicon pin structures is performed; it is shown that the coefficient of the collection of generated charge carriers can be as high as 13%. The dose dependences of the performance efficiency of silicon [beta]- voltaic structures are determined for the case of irradiation with a particles and [gamma]-ray photons; it is shown that 1.3 x [10.sup.14] and [10.sup.20] [cm.sup.-2], respectively, are the threshold doses, above which a rapid decrease in efficiency occurs. The optimal parameters of microchannel structures in [beta]-voltaic electronics, in which the width of the channels and the distance between them correspond to 3 and 10 [micro]m, are determined. DOI: 10.1134/S1063782616010188</abstract><pub>Springer</pub><doi>10.1134/S1063782616010188</doi></addata></record>
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title Simulation of the [beta]-Voltaic Effect in Silicon pin Structures Irradiated with Electrons From a Nickel-63 [beta] Source
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T20%3A10%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-gale&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Simulation%20of%20the%20%5Bbeta%5D-Voltaic%20Effect%20in%20Silicon%20pin%20Structures%20Irradiated%20with%20Electrons%20From%20a%20Nickel-63%20%5Bbeta%5D%20Source&rft.jtitle=Semiconductors%20(Woodbury,%20N.Y.)&rft.au=Nagornov,%20Yu.S&rft.date=2016-01-01&rft.volume=50&rft.issue=1&rft.spage=16&rft.pages=16-&rft.issn=1063-7826&rft_id=info:doi/10.1134/S1063782616010188&rft_dat=%3Cgale%3EA539035076%3C/gale%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_galeid=A539035076&rfr_iscdi=true