Formation of the low-resistivity compound [Cu.sub.3]Ge by low-temperature treatment in an atomic hydrogen flux
The systematic features of the formation of the low-resistivity compound [Cu.sub.3]Ge by low-temperature treatment of a Cu/Ge two-layer system in an atomic hydrogen flux are studied. The Cu/Ge two-layer system is deposited onto an i-GaAs substrate. Treatment of the Cu/Ge/i-GaAs system, in which the...
Gespeichert in:
Veröffentlicht in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2016-09, Vol.50 (9), p.1236 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!