Analytical characterization of B[C.sub.x][N.sub.y] films generated by LPCVD with triethylamine borane

Triethylamine borane (TEAB) and He, N2 or NH3 were applied as additional reaction gases in the production of B[C.sub.x][N.sub.y] layers by low-pressure chemical vapor deposition (LPCVD). These layers were deposited on Si(100) wafers and characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total-reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine-structure spectroscopy (TXRF-NEXAFS). The composition of the material produced without NH3 was found to be dominated by B--C bonds with the stoichiometric formula [B.sub.2][C.sub.3]N, B-N bonds with the formula [B.sub.2]C[N.sub.3] were preferred when N[H.sub.3] was added. A first attempt was made to compare the results obtained by applying trimethylamine borane and TEAB as single-source precursors. Keywords LPCVD * Boron carbonitride films * XPS * TXRF-NEXAFS