Formation of the Crystalline Structure of a Silicon Surface in Active Media During Polishing

When surfactants are present in polishing compositions severe damage is done to the initial crystal structure of a very thin (tenths and hundredths of a micron thick) surface layer of the material (silicon) being processed and the deformation-strength properties of the material change as a result of...

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Veröffentlicht in:	Glass and ceramics 2014-09, Vol.71 (5-6), p.169-171
Hauptverfasser:	Kanaev, A. A., Gorodetskii, A. E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Ceramics Characterization and Evaluation of Materials Chemical properties Chemistry and Materials Science Composites Crystals Glass Materials Processing Materials Science Natural Materials Silicon Structure Surface active agents
Online-Zugang:	Volltext
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