Formation of the Crystalline Structure of a Silicon Surface in Active Media During Polishing
When surfactants are present in polishing compositions severe damage is done to the initial crystal structure of a very thin (tenths and hundredths of a micron thick) surface layer of the material (silicon) being processed and the deformation-strength properties of the material change as a result of...
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| Veröffentlicht in: | Glass and ceramics 2014-09, Vol.71 (5-6), p.169-171 |
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| container_end_page | 171 |
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| container_issue | 5-6 |
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| container_title | Glass and ceramics |
| container_volume | 71 |
| creator | Kanaev, A. A. Gorodetskii, A. E. |
| description | When surfactants are present in polishing compositions severe damage is done to the initial crystal structure of a very thin (tenths and hundredths of a micron thick) surface layer of the material (silicon) being processed and the deformation-strength properties of the material change as a result of the Rebinder effect. The use of active additives in polishing compositions, including unconventional ones, makes it possible to decrease the thickness of the damaged layer by a factor of 1.5 – 2, significantly increasing the polishing efficiency in the process. |
| doi_str_mv | 10.1007/s10717-014-9644-8 |
| format | Article |
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The use of active additives in polishing compositions, including unconventional ones, makes it possible to decrease the thickness of the damaged layer by a factor of 1.5 – 2, significantly increasing the polishing efficiency in the process.</description><subject>Ceramics</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemical properties</subject><subject>Chemistry and Materials Science</subject><subject>Composites</subject><subject>Crystals</subject><subject>Glass</subject><subject>Materials Processing</subject><subject>Materials Science</subject><subject>Natural Materials</subject><subject>Silicon</subject><subject>Structure</subject><subject>Surface active agents</subject><issn>0361-7610</issn><issn>1573-8515</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNp9kE9PwyAYh4nRxDn9AN64emBC_9Eel-l0yYzG6s2E0PKysXTtAtS4by9Nvexi3gNv4Pe8wIPQLaMzRim_d4xyxgllCSmyJCH5GZqwlMckT1l6jiY0zhjhGaOX6Mq5HaW04DyeoK9lZ_fSm67FncZ-C3hhj87LpjEt4NLbvva9heFQ4tI0pg7Jsrda1oBNi-e1N9-AX0AZiR96a9oNfusa47ahu0YXWjYObv7WKfpcPn4snsn69Wm1mK9JncTMk0pFUZxneQpplac8h6guZJ5qTiulOKgqi5mWCbBIR4XSiYzTJFKJpkprCVTHUzQb525kA8K0uvNW1qEU7IcHgzZhfx7uCP8OdgJwdwKEjIcfv5G9c2JVvp9m2ZitbeecBS0O1uylPQpGxeBejO5FcC8G9yIPTDQy7jAYASt2XW_b4OAf6BcYEYb3</recordid><startdate>20140901</startdate><enddate>20140901</enddate><creator>Kanaev, A. 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| ispartof | Glass and ceramics, 2014-09, Vol.71 (5-6), p.169-171 |
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| source | SpringerLink Journals |
| subjects | Ceramics Characterization and Evaluation of Materials Chemical properties Chemistry and Materials Science Composites Crystals Glass Materials Processing Materials Science Natural Materials Silicon Structure Surface active agents |
| title | Formation of the Crystalline Structure of a Silicon Surface in Active Media During Polishing |
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