Kinetics of the formation and growth of critical nuclei in nanostructured films of borides, nitrides, and silicides

The kinetics of formation and growth of critical nuclei in nanostructured films of borides, nitrides, and silicides grown by ion deposition methods has been studied using X-ray diffraction, electron microscopy, and secondary-ion mass spectrometry. The relationships have been obtained allowing not only the calculation of the critical nucleus size, the rate of their formation and growth in the films, but also the prediction of these parameters based on the data on adhesion, supersaturation, and elastic characteristics of grown phases.