Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting

Transition-metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co-P films were deposited by using PH3 plasma as the phosphorus source and an extra H2 plasma step to remove excess P in the growing films. The optimized ALD process proceeded by se...

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Hauptverfasser:	Zhang, H, Hagen, D.J, Li, X, Graff, A, Heyroth, F, Fuhrmann, B, Kostanovskiy, I, Schweizer, S.L, Caddeo, F, Maijenburg, A.W, Parkin, S, Wehrspohn, R.B
Format:	Artikel
Sprache:	eng
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