In Situ Solar Wafer Temperature Measurement during Firing Process via Inline IR Thermography

Herein, an inline IR thermography system as an innovative application for real‐time contactless temperature measurement of wafers—both metallized and nonmetallized-during the firing process is successfully realized in an industrial firing furnace as proof of concept and example for a thermography system in a conveyor furnace. As observed by the new system, thermocouples (TCs) seem to measure lower temperature on wafers-especially in combination with TC frames-than wafers exhibit at standard firing conditions (here up to ΔT ≈ 40 K). Furthermore, highly resolved spatial temperature distribution can be successfully measured on the wafer.