Evaluation of novel metalorganic precursors for atomic layer deposition of Nickel-based thin films
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ger</language><subject>4PP ; 4PPNMOS ; AFM ; ALD ; Atomic layer deposition ; Atomlagenabscheidung ; CMOS ; CVD ; Differential scanning calorimetry ; differential thermal analysis ; Differential Thermoanalysis ; Differentialthermoanalyse ; DSC ; DTA ; DTG ; EGA ; FDPC ; four-point probe ; four-point test ; GPC ; IHM ; Industrial and craft manufacturing ; Industrielle und handwerkliche Fertigung ; IPMS-CNT ; microelectronics ; Mikroelektronik ; nickel silicide ; Nickel silicon ; Nickel Silizid ; Nuclear deposition ; optical layer stack ; physical vapor deposition ; QCM ; quartz crystal microbalance ; Quarzmikrowaage ; rapid thermal processing ; Rasterelektronenmikroskop ; RTP ; Röntgen-Photoelektronenspektroskopie ; Röntgendiffraktometrie ; scanning electron microscope ; scanning electron microscopy ; SEM ; Thermal Analysis ; Thermoanalyse ; thermogravimetric analysis ; TO HIM ; trimethylaluminum ; X-ray ; XPS ; XRD ; XRR</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://data.europeana.eu/item/2048441/item_6SELDEUU7M6SIDR2Y3ORJKMQSZF4CRP7$$EHTML$$P50$$Geuropeana$$Hfree_for_read</linktohtml><link.rule.ids>782,38524,76184</link.rule.ids><linktorsrc>$$Uhttps://data.europeana.eu/item/2048441/item_6SELDEUU7M6SIDR2Y3ORJKMQSZF4CRP7$$EView_record_in_Europeana$$FView_record_in_$$GEuropeana$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Sharma, Varun</creatorcontrib><title>Evaluation of novel metalorganic precursors for atomic layer deposition of Nickel-based thin films</title><subject>4PP</subject><subject>4PPNMOS</subject><subject>AFM</subject><subject>ALD</subject><subject>Atomic layer deposition</subject><subject>Atomlagenabscheidung</subject><subject>CMOS</subject><subject>CVD</subject><subject>Differential scanning calorimetry</subject><subject>differential thermal analysis</subject><subject>Differential Thermoanalysis</subject><subject>Differentialthermoanalyse</subject><subject>DSC</subject><subject>DTA</subject><subject>DTG</subject><subject>EGA</subject><subject>FDPC</subject><subject>four-point probe</subject><subject>four-point test</subject><subject>GPC</subject><subject>IHM</subject><subject>Industrial and craft manufacturing</subject><subject>Industrielle und handwerkliche Fertigung</subject><subject>IPMS-CNT</subject><subject>microelectronics</subject><subject>Mikroelektronik</subject><subject>nickel silicide</subject><subject>Nickel silicon</subject><subject>Nickel Silizid</subject><subject>Nuclear deposition</subject><subject>optical layer stack</subject><subject>physical vapor deposition</subject><subject>QCM</subject><subject>quartz crystal microbalance</subject><subject>Quarzmikrowaage</subject><subject>rapid thermal processing</subject><subject>Rasterelektronenmikroskop</subject><subject>RTP</subject><subject>Röntgen-Photoelektronenspektroskopie</subject><subject>Röntgendiffraktometrie</subject><subject>scanning electron microscope</subject><subject>scanning electron microscopy</subject><subject>SEM</subject><subject>Thermal Analysis</subject><subject>Thermoanalyse</subject><subject>thermogravimetric analysis</subject><subject>TO HIM</subject><subject>trimethylaluminum</subject><subject>X-ray</subject><subject>XPS</subject><subject>XRD</subject><subject>XRR</subject><fulltext>true</fulltext><rsrctype>web_resource</rsrctype><creationdate>2015</creationdate><recordtype>web_resource</recordtype><sourceid>1GC</sourceid><recordid>eNqtjEkKwkAQAHPxIOof-gOCS1DvGnFfEnPQS2jHjg52psPMRPD3KugPPBUUVNWDc_RArtBrMSA5GHkQQ0EeWewVjVZQWlKVdWId5GIBvRRvy_gkCxcqxelfvNHqTtw-o6ML-Js2kGsuXDOo5ciOWl82gsU0OoxnbaqslIQGMyXMpD4fl_U64SgMu5n2VGSDJFpNojQdrgfJfBL3jv1tvFiu98lpGo7j3bD_19kL2RRaBA</recordid><startdate>2015</startdate><enddate>2015</enddate><creator>Sharma, Varun</creator><scope>1GC</scope></search><sort><creationdate>2015</creationdate><title>Evaluation of novel metalorganic precursors for atomic layer deposition of Nickel-based thin films</title><author>Sharma, Varun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-europeana_collections_2048441_item_6SELDEUU7M6SIDR2Y3ORJKMQSZF4CRP73</frbrgroupid><rsrctype>web_resources</rsrctype><prefilter>web_resources</prefilter><language>eng ; ger</language><creationdate>2015</creationdate><topic>4PP</topic><topic>4PPNMOS</topic><topic>AFM</topic><topic>ALD</topic><topic>Atomic layer deposition</topic><topic>Atomlagenabscheidung</topic><topic>CMOS</topic><topic>CVD</topic><topic>Differential scanning calorimetry</topic><topic>differential thermal analysis</topic><topic>Differential Thermoanalysis</topic><topic>Differentialthermoanalyse</topic><topic>DSC</topic><topic>DTA</topic><topic>DTG</topic><topic>EGA</topic><topic>FDPC</topic><topic>four-point probe</topic><topic>four-point test</topic><topic>GPC</topic><topic>IHM</topic><topic>Industrial and craft manufacturing</topic><topic>Industrielle und handwerkliche Fertigung</topic><topic>IPMS-CNT</topic><topic>microelectronics</topic><topic>Mikroelektronik</topic><topic>nickel silicide</topic><topic>Nickel silicon</topic><topic>Nickel Silizid</topic><topic>Nuclear deposition</topic><topic>optical layer stack</topic><topic>physical vapor deposition</topic><topic>QCM</topic><topic>quartz crystal microbalance</topic><topic>Quarzmikrowaage</topic><topic>rapid thermal processing</topic><topic>Rasterelektronenmikroskop</topic><topic>RTP</topic><topic>Röntgen-Photoelektronenspektroskopie</topic><topic>Röntgendiffraktometrie</topic><topic>scanning electron microscope</topic><topic>scanning electron microscopy</topic><topic>SEM</topic><topic>Thermal Analysis</topic><topic>Thermoanalyse</topic><topic>thermogravimetric analysis</topic><topic>TO HIM</topic><topic>trimethylaluminum</topic><topic>X-ray</topic><topic>XPS</topic><topic>XRD</topic><topic>XRR</topic><toplevel>online_resources</toplevel><creatorcontrib>Sharma, Varun</creatorcontrib><collection>Europeana Collections</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Sharma, Varun</au><format>book</format><genre>unknown</genre><ristype>GEN</ristype><btitle>Evaluation of novel metalorganic precursors for atomic layer deposition of Nickel-based thin films</btitle><date>2015</date><risdate>2015</risdate><oa>free_for_read</oa></addata></record> |
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| language | eng ; ger |
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| source | Europeana Collections |
| subjects | 4PP 4PPNMOS AFM ALD Atomic layer deposition Atomlagenabscheidung CMOS CVD Differential scanning calorimetry differential thermal analysis Differential Thermoanalysis Differentialthermoanalyse DSC DTA DTG EGA FDPC four-point probe four-point test GPC IHM Industrial and craft manufacturing Industrielle und handwerkliche Fertigung IPMS-CNT microelectronics Mikroelektronik nickel silicide Nickel silicon Nickel Silizid Nuclear deposition optical layer stack physical vapor deposition QCM quartz crystal microbalance Quarzmikrowaage rapid thermal processing Rasterelektronenmikroskop RTP Röntgen-Photoelektronenspektroskopie Röntgendiffraktometrie scanning electron microscope scanning electron microscopy SEM Thermal Analysis Thermoanalyse thermogravimetric analysis TO HIM trimethylaluminum X-ray XPS XRD XRR |
| title | Evaluation of novel metalorganic precursors for atomic layer deposition of Nickel-based thin films |
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