Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon

Carbon is deposited on a substrate through plasma enhanced chemical vapor deposition of a decomposable processor containing a seed material additive. The seed material is a hydrocarbon having a high concentration of sp tetrahedrally-coordinated carbon. The seed material provides a template for the r...

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Bibliographische Detailangaben
1. Verfasser: WAGNER, JOHN RALPH, JR
Format: Patent
Sprache:eng
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Zusammenfassung:Carbon is deposited on a substrate through plasma enhanced chemical vapor deposition of a decomposable processor containing a seed material additive. The seed material is a hydrocarbon having a high concentration of sp tetrahedrally-coordinated carbon. The seed material provides a template for the replication of sp tetrahedrally-coordinated carbon atoms in the deposited amorphous carbon coating.