ENHANCED VERTICAL THERMAL REACTOR SYSTEM

An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber (12), a process chamber (14) including an elevator, and a cool-down chamber (16), each sealed from the other. The sealing of these individual chambers, each from the other, has the effect...

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Hauptverfasser: OZARSKI, ROBERT, G, MCNAUGHTON, ALLEN, D, GLAZE, JAMES, A, DEVILBISS, JOHN, J, LUGOSI, STEVE
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MCNAUGHTON, ALLEN, D
GLAZE, JAMES, A
DEVILBISS, JOHN, J
LUGOSI, STEVE
description An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber (12), a process chamber (14) including an elevator, and a cool-down chamber (16), each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. L'invention se rapporte à un système de réacteur thermique vertical amélioré, qui est composé de trois chambres isolées, soit une chambre (12) de manipulation des plaques semi-conductrices, une chambres de traitement (14) contenant un élévateur et une chambre de refroidissement (16), scellées entre elles. Le scellement de ces chambres l'une par rapport à l'autre permet de réduire au minimum les retards de traitement associés au processus de refroidissement et au processus de chargement et de déchargement, ce qui améliore la productivité du four.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO9102106A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO9102106A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO9102106A13</originalsourceid><addsrcrecordid>eNrjZNBw9fNw9HN2dVEIcw0K8XR29FEI8XAN8gXSQa6OziH-QQrBkcEhrr48DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSQ-3N_S0MDI0MDM0dCYCCUAyOoj0Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><source>esp@cenet</source><creator>OZARSKI, ROBERT, G ; MCNAUGHTON, ALLEN, D ; GLAZE, JAMES, A ; DEVILBISS, JOHN, J ; LUGOSI, STEVE</creator><creatorcontrib>OZARSKI, ROBERT, G ; MCNAUGHTON, ALLEN, D ; GLAZE, JAMES, A ; DEVILBISS, JOHN, J ; LUGOSI, STEVE</creatorcontrib><description>An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber (12), a process chamber (14) including an elevator, and a cool-down chamber (16), each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. L'invention se rapporte à un système de réacteur thermique vertical amélioré, qui est composé de trois chambres isolées, soit une chambre (12) de manipulation des plaques semi-conductrices, une chambres de traitement (14) contenant un élévateur et une chambre de refroidissement (16), scellées entre elles. Le scellement de ces chambres l'une par rapport à l'autre permet de réduire au minimum les retards de traitement associés au processus de refroidissement et au processus de chargement et de déchargement, ce qui améliore la productivité du four.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FURNACES ; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL ; HEATING ; KILNS ; LIGHTING ; MECHANICAL ENGINEERING ; OPEN SINTERING OR LIKE APPARATUS ; OVENS ; RETORTS ; SEMICONDUCTOR DEVICES ; WEAPONS</subject><creationdate>1991</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19910221&amp;DB=EPODOC&amp;CC=WO&amp;NR=9102106A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19910221&amp;DB=EPODOC&amp;CC=WO&amp;NR=9102106A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OZARSKI, ROBERT, G</creatorcontrib><creatorcontrib>MCNAUGHTON, ALLEN, D</creatorcontrib><creatorcontrib>GLAZE, JAMES, A</creatorcontrib><creatorcontrib>DEVILBISS, JOHN, J</creatorcontrib><creatorcontrib>LUGOSI, STEVE</creatorcontrib><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><description>An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber (12), a process chamber (14) including an elevator, and a cool-down chamber (16), each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. L'invention se rapporte à un système de réacteur thermique vertical amélioré, qui est composé de trois chambres isolées, soit une chambre (12) de manipulation des plaques semi-conductrices, une chambres de traitement (14) contenant un élévateur et une chambre de refroidissement (16), scellées entre elles. Le scellement de ces chambres l'une par rapport à l'autre permet de réduire au minimum les retards de traitement associés au processus de refroidissement et au processus de chargement et de déchargement, ce qui améliore la productivité du four.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FURNACES</subject><subject>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</subject><subject>HEATING</subject><subject>KILNS</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>OPEN SINTERING OR LIKE APPARATUS</subject><subject>OVENS</subject><subject>RETORTS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1991</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBw9fNw9HN2dVEIcw0K8XR29FEI8XAN8gXSQa6OziH-QQrBkcEhrr48DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSQ-3N_S0MDI0MDM0dCYCCUAyOoj0Q</recordid><startdate>19910221</startdate><enddate>19910221</enddate><creator>OZARSKI, ROBERT, G</creator><creator>MCNAUGHTON, ALLEN, D</creator><creator>GLAZE, JAMES, A</creator><creator>DEVILBISS, JOHN, J</creator><creator>LUGOSI, STEVE</creator><scope>EVB</scope></search><sort><creationdate>19910221</creationdate><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><author>OZARSKI, ROBERT, G ; MCNAUGHTON, ALLEN, D ; GLAZE, JAMES, A ; DEVILBISS, JOHN, J ; LUGOSI, STEVE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO9102106A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1991</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FURNACES</topic><topic>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</topic><topic>HEATING</topic><topic>KILNS</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>OPEN SINTERING OR LIKE APPARATUS</topic><topic>OVENS</topic><topic>RETORTS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>OZARSKI, ROBERT, G</creatorcontrib><creatorcontrib>MCNAUGHTON, ALLEN, D</creatorcontrib><creatorcontrib>GLAZE, JAMES, A</creatorcontrib><creatorcontrib>DEVILBISS, JOHN, J</creatorcontrib><creatorcontrib>LUGOSI, STEVE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OZARSKI, ROBERT, G</au><au>MCNAUGHTON, ALLEN, D</au><au>GLAZE, JAMES, A</au><au>DEVILBISS, JOHN, J</au><au>LUGOSI, STEVE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ENHANCED VERTICAL THERMAL REACTOR SYSTEM</title><date>1991-02-21</date><risdate>1991</risdate><abstract>An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber (12), a process chamber (14) including an elevator, and a cool-down chamber (16), each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. L'invention se rapporte à un système de réacteur thermique vertical amélioré, qui est composé de trois chambres isolées, soit une chambre (12) de manipulation des plaques semi-conductrices, une chambres de traitement (14) contenant un élévateur et une chambre de refroidissement (16), scellées entre elles. Le scellement de ces chambres l'une par rapport à l'autre permet de réduire au minimum les retards de traitement associés au processus de refroidissement et au processus de chargement et de déchargement, ce qui améliore la productivité du four.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
BLASTING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FURNACES
FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL
HEATING
KILNS
LIGHTING
MECHANICAL ENGINEERING
OPEN SINTERING OR LIKE APPARATUS
OVENS
RETORTS
SEMICONDUCTOR DEVICES
WEAPONS
title ENHANCED VERTICAL THERMAL REACTOR SYSTEM
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T16%3A36%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OZARSKI,%20ROBERT,%20G&rft.date=1991-02-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO9102106A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true