STEREOLITHOGRAPHIC BEAM PROFILING
An apparatus and a method for profiling the intensity of a beam and thus measuring the overall intensity and power of a beam are disclosed that have particular use in stereolithography. A beam sensor (35) comprising a pinhole (45) in a plate (40) and a photodetector (55) behind the pinhole measures...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | TARNOFF, HARRY SPENCE, STUART, THOMAS ALMQUIST, THOMAS |
| description | An apparatus and a method for profiling the intensity of a beam and thus measuring the overall intensity and power of a beam are disclosed that have particular use in stereolithography. A beam sensor (35) comprising a pinhole (45) in a plate (40) and a photodetector (55) behind the pinhole measures the intensity of portions of a beam (50) as the beam is moved over the beam sensor. Software associated mechanism for the beam so that the beam is shifted to find the pinhole and move across it in order to develop the intensity profile. The invention can be used to detect drift in the scanning mechanism, determine the focus of the beam, and predict the depth and width of photopolymer cured by the beam. A related apparatus and method for calibrating and normalizing a stereolithographic apparatus is described, and a related apparatus and method for correcting for drift in production of objects by stereolithography, is also described.
On a mis au point un appareil et un procédé permettant de profiler l'intensité d'un faisceau et ainsi de mesurer l'intensité et la puissance globales d'un faisceau, lesquels ont une utilisation particulière en stéréolithographie. Un capteur (35) de faisceau comprenant un trou d'épingle (45) situé dans une plaque (40) ainsi qu'un photodétecteur (55) situé derrière le trou d'épingle, mesure l'intensité de parties d'un faisceau (50) à mesure que l'on déplace le faisceau sur le capteur de faisceau. Le logiciel associé aux capteurs se trouvant dans un ordinateur, commande le mécanisme de balayage du faisceau de sorte que ledit faisceau est décalé pour trouver le trou d'aiguille et se déplace au-dessus de ce dernier afin de mettre au point le profile d'intensité. On peut utiliser l'invention pour détecter la dérive dans le mécanisme de balayage, déterminer la focalisation du faisceau, et prédire la profondeur et la largeur de photopolymère durci par le faisceau. On a mis au point un appareil et un procédé permettant de calibrer et de normaliser un appareil stéréolithographique, ainsi qu'un appareil et un procédé permettant de corriger la dérive dans la production d'objets par stéréolithographie. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO8911085A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO8911085A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO8911085A13</originalsourceid><addsrcrecordid>eNrjZFAMDnENcvX38Qzx8HcPcgzw8HRWcHJ19FUICPJ38_Tx9HPnYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXx4f4WloaGBhamjobGRCgBAPCRIiE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>STEREOLITHOGRAPHIC BEAM PROFILING</title><source>esp@cenet</source><creator>TARNOFF, HARRY ; SPENCE, STUART, THOMAS ; ALMQUIST, THOMAS</creator><creatorcontrib>TARNOFF, HARRY ; SPENCE, STUART, THOMAS ; ALMQUIST, THOMAS</creatorcontrib><description>An apparatus and a method for profiling the intensity of a beam and thus measuring the overall intensity and power of a beam are disclosed that have particular use in stereolithography. A beam sensor (35) comprising a pinhole (45) in a plate (40) and a photodetector (55) behind the pinhole measures the intensity of portions of a beam (50) as the beam is moved over the beam sensor. Software associated mechanism for the beam so that the beam is shifted to find the pinhole and move across it in order to develop the intensity profile. The invention can be used to detect drift in the scanning mechanism, determine the focus of the beam, and predict the depth and width of photopolymer cured by the beam. A related apparatus and method for calibrating and normalizing a stereolithographic apparatus is described, and a related apparatus and method for correcting for drift in production of objects by stereolithography, is also described.
On a mis au point un appareil et un procédé permettant de profiler l'intensité d'un faisceau et ainsi de mesurer l'intensité et la puissance globales d'un faisceau, lesquels ont une utilisation particulière en stéréolithographie. Un capteur (35) de faisceau comprenant un trou d'épingle (45) situé dans une plaque (40) ainsi qu'un photodétecteur (55) situé derrière le trou d'épingle, mesure l'intensité de parties d'un faisceau (50) à mesure que l'on déplace le faisceau sur le capteur de faisceau. Le logiciel associé aux capteurs se trouvant dans un ordinateur, commande le mécanisme de balayage du faisceau de sorte que ledit faisceau est décalé pour trouver le trou d'aiguille et se déplace au-dessus de ce dernier afin de mettre au point le profile d'intensité. On peut utiliser l'invention pour détecter la dérive dans le mécanisme de balayage, déterminer la focalisation du faisceau, et prédire la profondeur et la largeur de photopolymère durci par le faisceau. On a mis au point un appareil et un procédé permettant de calibrer et de normaliser un appareil stéréolithographique, ainsi qu'un appareil et un procédé permettant de corriger la dérive dans la production d'objets par stéréolithographie.</description><edition>4</edition><language>eng</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COLORIMETRY ; COMPUTING ; COUNTING ; ELECTROGRAPHY ; HOLOGRAPHY ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; MATERIALS THEREFOR ; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT ; MEASURING ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; RADIATION PYROMETRY ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TESTING ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19891116&DB=EPODOC&CC=WO&NR=8911085A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19891116&DB=EPODOC&CC=WO&NR=8911085A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TARNOFF, HARRY</creatorcontrib><creatorcontrib>SPENCE, STUART, THOMAS</creatorcontrib><creatorcontrib>ALMQUIST, THOMAS</creatorcontrib><title>STEREOLITHOGRAPHIC BEAM PROFILING</title><description>An apparatus and a method for profiling the intensity of a beam and thus measuring the overall intensity and power of a beam are disclosed that have particular use in stereolithography. A beam sensor (35) comprising a pinhole (45) in a plate (40) and a photodetector (55) behind the pinhole measures the intensity of portions of a beam (50) as the beam is moved over the beam sensor. Software associated mechanism for the beam so that the beam is shifted to find the pinhole and move across it in order to develop the intensity profile. The invention can be used to detect drift in the scanning mechanism, determine the focus of the beam, and predict the depth and width of photopolymer cured by the beam. A related apparatus and method for calibrating and normalizing a stereolithographic apparatus is described, and a related apparatus and method for correcting for drift in production of objects by stereolithography, is also described.
On a mis au point un appareil et un procédé permettant de profiler l'intensité d'un faisceau et ainsi de mesurer l'intensité et la puissance globales d'un faisceau, lesquels ont une utilisation particulière en stéréolithographie. Un capteur (35) de faisceau comprenant un trou d'épingle (45) situé dans une plaque (40) ainsi qu'un photodétecteur (55) situé derrière le trou d'épingle, mesure l'intensité de parties d'un faisceau (50) à mesure que l'on déplace le faisceau sur le capteur de faisceau. Le logiciel associé aux capteurs se trouvant dans un ordinateur, commande le mécanisme de balayage du faisceau de sorte que ledit faisceau est décalé pour trouver le trou d'aiguille et se déplace au-dessus de ce dernier afin de mettre au point le profile d'intensité. On peut utiliser l'invention pour détecter la dérive dans le mécanisme de balayage, déterminer la focalisation du faisceau, et prédire la profondeur et la largeur de photopolymère durci par le faisceau. On a mis au point un appareil et un procédé permettant de calibrer et de normaliser un appareil stéréolithographique, ainsi qu'un appareil et un procédé permettant de corriger la dérive dans la production d'objets par stéréolithographie.</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COLORIMETRY</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</subject><subject>MATERIALS THEREFOR</subject><subject>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</subject><subject>MEASURING</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>RADIATION PYROMETRY</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1989</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAMDnENcvX38Qzx8HcPcgzw8HRWcHJ19FUICPJ38_Tx9HPnYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXx4f4WloaGBhamjobGRCgBAPCRIiE</recordid><startdate>19891116</startdate><enddate>19891116</enddate><creator>TARNOFF, HARRY</creator><creator>SPENCE, STUART, THOMAS</creator><creator>ALMQUIST, THOMAS</creator><scope>EVB</scope></search><sort><creationdate>19891116</creationdate><title>STEREOLITHOGRAPHIC BEAM PROFILING</title><author>TARNOFF, HARRY ; SPENCE, STUART, THOMAS ; ALMQUIST, THOMAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO8911085A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1989</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COLORIMETRY</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</topic><topic>MATERIALS THEREFOR</topic><topic>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</topic><topic>MEASURING</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>RADIATION PYROMETRY</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>TARNOFF, HARRY</creatorcontrib><creatorcontrib>SPENCE, STUART, THOMAS</creatorcontrib><creatorcontrib>ALMQUIST, THOMAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TARNOFF, HARRY</au><au>SPENCE, STUART, THOMAS</au><au>ALMQUIST, THOMAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>STEREOLITHOGRAPHIC BEAM PROFILING</title><date>1989-11-16</date><risdate>1989</risdate><abstract>An apparatus and a method for profiling the intensity of a beam and thus measuring the overall intensity and power of a beam are disclosed that have particular use in stereolithography. A beam sensor (35) comprising a pinhole (45) in a plate (40) and a photodetector (55) behind the pinhole measures the intensity of portions of a beam (50) as the beam is moved over the beam sensor. Software associated mechanism for the beam so that the beam is shifted to find the pinhole and move across it in order to develop the intensity profile. The invention can be used to detect drift in the scanning mechanism, determine the focus of the beam, and predict the depth and width of photopolymer cured by the beam. A related apparatus and method for calibrating and normalizing a stereolithographic apparatus is described, and a related apparatus and method for correcting for drift in production of objects by stereolithography, is also described.
On a mis au point un appareil et un procédé permettant de profiler l'intensité d'un faisceau et ainsi de mesurer l'intensité et la puissance globales d'un faisceau, lesquels ont une utilisation particulière en stéréolithographie. Un capteur (35) de faisceau comprenant un trou d'épingle (45) situé dans une plaque (40) ainsi qu'un photodétecteur (55) situé derrière le trou d'épingle, mesure l'intensité de parties d'un faisceau (50) à mesure que l'on déplace le faisceau sur le capteur de faisceau. Le logiciel associé aux capteurs se trouvant dans un ordinateur, commande le mécanisme de balayage du faisceau de sorte que ledit faisceau est décalé pour trouver le trou d'aiguille et se déplace au-dessus de ce dernier afin de mettre au point le profile d'intensité. On peut utiliser l'invention pour détecter la dérive dans le mécanisme de balayage, déterminer la focalisation du faisceau, et prédire la profondeur et la largeur de photopolymère durci par le faisceau. On a mis au point un appareil et un procédé permettant de calibrer et de normaliser un appareil stéréolithographique, ainsi qu'un appareil et un procédé permettant de corriger la dérive dans la production d'objets par stéréolithographie.</abstract><edition>4</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_WO8911085A1 |
| source | esp@cenet |
| subjects | AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COLORIMETRY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TESTING TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
| title | STEREOLITHOGRAPHIC BEAM PROFILING |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T04%3A28%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TARNOFF,%20HARRY&rft.date=1989-11-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO8911085A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |