RETICLE DESIGN FOR MINIMIZING THERMAL STRAIN

A method for reducing thermal strain in a reticle includes determining a target operating temperature of a reticle during use of the reticle, adjusting a thermal expansion (TE) property of the reticle based on the target operating temperature of the reticle, and exposing the reticle to radiation to...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MAKARENKO, Ksenia, VAN DER SANDEN, Jacobus, FINNEY, Nathan, RADEMAKER, Justin, VAN DE KERKHOF, Marcus, DEENEN, Daniel, LIPSON, Matthew, MELFI, JR, BAKER, Lowell
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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