SYSTEM AND PROCESS FOR IMPRINTING

The invention relates to a system for imprinting, in particular nanoimprinting, comprising at least one substantially flexible stamp configured for imprinting, in particular nanoimprinting, at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TER MEULEN, Jan Matthijs, NEELEN, Rob Antonius Waltherus
Format: Patent
Sprache:eng ; fre
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator TER MEULEN, Jan Matthijs
NEELEN, Rob Antonius Waltherus
description The invention relates to a system for imprinting, in particular nanoimprinting, comprising at least one substantially flexible stamp configured for imprinting, in particular nanoimprinting, at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate which is to be imprinted and at least one stage configured for providing support to at least one substrate during imprinting, wherein at least one roller and at least one stage are mutually displaceable in at least an imprint direction in particular such that imprinting is facilitated and wherein the system comprises at least one connector which is configured to improve the alignment before and during imprinting. L'invention concerne un système d'impression, en particulier de nano-impression, comprenant au moins un tampon sensiblement flexible configuré pour l'impression, en particulier la nano-impression, au moins un rouleau configuré pour exercer une pression sur au moins un tampon sensiblement flexible et/ou au moins un substrat qui doit être imprimé et au moins un étage configuré pour fournir un support à au moins un substrat pendant l'impression, au moins un rouleau et au moins un étage étant mutuellement déplaçables dans au moins une direction d'impression en particulier de telle sorte que l'impression est facilitée et le système comprenant au moins un connecteur qui est configuré pour améliorer l'alignement avant et pendant l'impression.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2024232753A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2024232753A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2024232753A13</originalsourceid><addsrcrecordid>eNrjZFAMjgwOcfVVcPRzUQgI8nd2DQ5WcPMPUvD0DQjy9Avx9HPnYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBkYmRsZG5qbGjobGxKkCAKu7IzM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SYSTEM AND PROCESS FOR IMPRINTING</title><source>esp@cenet</source><creator>TER MEULEN, Jan Matthijs ; NEELEN, Rob Antonius Waltherus</creator><creatorcontrib>TER MEULEN, Jan Matthijs ; NEELEN, Rob Antonius Waltherus</creatorcontrib><description>The invention relates to a system for imprinting, in particular nanoimprinting, comprising at least one substantially flexible stamp configured for imprinting, in particular nanoimprinting, at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate which is to be imprinted and at least one stage configured for providing support to at least one substrate during imprinting, wherein at least one roller and at least one stage are mutually displaceable in at least an imprint direction in particular such that imprinting is facilitated and wherein the system comprises at least one connector which is configured to improve the alignment before and during imprinting. L'invention concerne un système d'impression, en particulier de nano-impression, comprenant au moins un tampon sensiblement flexible configuré pour l'impression, en particulier la nano-impression, au moins un rouleau configuré pour exercer une pression sur au moins un tampon sensiblement flexible et/ou au moins un substrat qui doit être imprimé et au moins un étage configuré pour fournir un support à au moins un substrat pendant l'impression, au moins un rouleau et au moins un étage étant mutuellement déplaçables dans au moins une direction d'impression en particulier de telle sorte que l'impression est facilitée et le système comprenant au moins un connecteur qui est configuré pour améliorer l'alignement avant et pendant l'impression.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20241114&amp;DB=EPODOC&amp;CC=WO&amp;NR=2024232753A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20241114&amp;DB=EPODOC&amp;CC=WO&amp;NR=2024232753A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TER MEULEN, Jan Matthijs</creatorcontrib><creatorcontrib>NEELEN, Rob Antonius Waltherus</creatorcontrib><title>SYSTEM AND PROCESS FOR IMPRINTING</title><description>The invention relates to a system for imprinting, in particular nanoimprinting, comprising at least one substantially flexible stamp configured for imprinting, in particular nanoimprinting, at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate which is to be imprinted and at least one stage configured for providing support to at least one substrate during imprinting, wherein at least one roller and at least one stage are mutually displaceable in at least an imprint direction in particular such that imprinting is facilitated and wherein the system comprises at least one connector which is configured to improve the alignment before and during imprinting. L'invention concerne un système d'impression, en particulier de nano-impression, comprenant au moins un tampon sensiblement flexible configuré pour l'impression, en particulier la nano-impression, au moins un rouleau configuré pour exercer une pression sur au moins un tampon sensiblement flexible et/ou au moins un substrat qui doit être imprimé et au moins un étage configuré pour fournir un support à au moins un substrat pendant l'impression, au moins un rouleau et au moins un étage étant mutuellement déplaçables dans au moins une direction d'impression en particulier de telle sorte que l'impression est facilitée et le système comprenant au moins un connecteur qui est configuré pour améliorer l'alignement avant et pendant l'impression.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAMjgwOcfVVcPRzUQgI8nd2DQ5WcPMPUvD0DQjy9Avx9HPnYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBkYmRsZG5qbGjobGxKkCAKu7IzM</recordid><startdate>20241114</startdate><enddate>20241114</enddate><creator>TER MEULEN, Jan Matthijs</creator><creator>NEELEN, Rob Antonius Waltherus</creator><scope>EVB</scope></search><sort><creationdate>20241114</creationdate><title>SYSTEM AND PROCESS FOR IMPRINTING</title><author>TER MEULEN, Jan Matthijs ; NEELEN, Rob Antonius Waltherus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2024232753A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>TER MEULEN, Jan Matthijs</creatorcontrib><creatorcontrib>NEELEN, Rob Antonius Waltherus</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TER MEULEN, Jan Matthijs</au><au>NEELEN, Rob Antonius Waltherus</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SYSTEM AND PROCESS FOR IMPRINTING</title><date>2024-11-14</date><risdate>2024</risdate><abstract>The invention relates to a system for imprinting, in particular nanoimprinting, comprising at least one substantially flexible stamp configured for imprinting, in particular nanoimprinting, at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate which is to be imprinted and at least one stage configured for providing support to at least one substrate during imprinting, wherein at least one roller and at least one stage are mutually displaceable in at least an imprint direction in particular such that imprinting is facilitated and wherein the system comprises at least one connector which is configured to improve the alignment before and during imprinting. L'invention concerne un système d'impression, en particulier de nano-impression, comprenant au moins un tampon sensiblement flexible configuré pour l'impression, en particulier la nano-impression, au moins un rouleau configuré pour exercer une pression sur au moins un tampon sensiblement flexible et/ou au moins un substrat qui doit être imprimé et au moins un étage configuré pour fournir un support à au moins un substrat pendant l'impression, au moins un rouleau et au moins un étage étant mutuellement déplaçables dans au moins une direction d'impression en particulier de telle sorte que l'impression est facilitée et le système comprenant au moins un connecteur qui est configuré pour améliorer l'alignement avant et pendant l'impression.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre
recordid cdi_epo_espacenet_WO2024232753A1
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title SYSTEM AND PROCESS FOR IMPRINTING
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T04%3A16%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TER%20MEULEN,%20Jan%20Matthijs&rft.date=2024-11-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2024232753A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true