METHOD FOR ETCHING HIGH ASPECT RATIO STRUCTURES

A method and system for etching high aspect ratio structures in a semiconducting processing chamber are disclosed herein. In one example, a method of patterning a substrate comprises etching the substrate to form a recess, depositing a passivation layer on sidewalls of the recess, treating the passi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHOU, Hailong, LIU, Tong, CHOI, Jayoung, PARK, Sangjun, FU, Qian, AGARWAL, Radhe, QIAO, Feng
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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