THICK FILM CHEMICALLY AMPLIFIED POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME

THICK FILM CHEMICALLY AMPLIFIED POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME

Provided is a thick film chemically amplified positive type resist composition. A thick film chemically amplified positive type resist composition comprising an alkali-soluble resin (A) having a certain structure, a photoacid generator (B), and a solvent (C). L'invention concerne une compositio...

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Hauptverfasser: KATAYAMA, Tomohide, SAO, Takayuki, WATANABE, Kenta
Format: Patent
Sprache:eng ; fre
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator KATAYAMA, Tomohide
SAO, Takayuki
WATANABE, Kenta
description Provided is a thick film chemically amplified positive type resist composition. A thick film chemically amplified positive type resist composition comprising an alkali-soluble resin (A) having a certain structure, a photoacid generator (B), and a solvent (C). L'invention concerne une composition de photorésine de type positif chimiquement amplifiée à film épais. La composition de photorésine de type positif chimiquement amplifiée à film épais comprend une résine soluble dans les alcalis (A) ayant une certaine structure, un générateur de photoacide (B) et un solvant (C).
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A thick film chemically amplified positive type resist composition comprising an alkali-soluble resin (A) having a certain structure, a photoacid generator (B), and a solvent (C). L'invention concerne une composition de photorésine de type positif chimiquement amplifiée à film épais. 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A thick film chemically amplified positive type resist composition comprising an alkali-soluble resin (A) having a certain structure, a photoacid generator (B), and a solvent (C). L'invention concerne une composition de photorésine de type positif chimiquement amplifiée à film épais. La composition de photorésine de type positif chimiquement amplifiée à film épais comprend une résine soluble dans les alcalis (A) ayant une certaine structure, un générateur de photoacide (B) et un solvant (C).</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title THICK FILM CHEMICALLY AMPLIFIED POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME
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