REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING

Embodiments of the present disclosure generally relate to a system used in a semiconductor device manufacturing process. More specifically, embodiments provided herein generally include apparatus and methods for synchronizing and controlling the delivery of an RF bias signal and a pulsed voltage wav...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LI, Deyang, EPPLER, Aaron, LIU, Chung, NICHOLS, Michael, DASH, Shreeram, SRINIVASAN, Sunil, LIU, Kuan-Ting, CHOU, Yi-Chuan, KENNEY, Jason, RAUF, Shahid, JOUBERT, Olivier
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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