GAS DISTRIBUTION DEVICE AND CHLORINATION FURNACE
Disclosed are a gas distribution device and a chlorination furnace. The device comprises: a distribution plate, a plurality of through holes being formed in the distribution plate; a plurality of branch pipes, the plurality of branch pipes passing through the plurality of through holes; and a main a...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng ; fre |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | WANG, Jianxin ZHOU, Li WANG, Dongsheng YE, Endong |
| description | Disclosed are a gas distribution device and a chlorination furnace. The device comprises: a distribution plate, a plurality of through holes being formed in the distribution plate; a plurality of branch pipes, the plurality of branch pipes passing through the plurality of through holes; and a main air inlet pipe, which is arranged on the outer side of the bottom surface of the distribution plate. The plurality of branch pipes communicate with the main air inlet pipe. A plurality of grooves are formed in the top surface of the distribution plate. The size of each groove gradually decreases from a groove opening to a groove bottom. The groove bottom of each of the grooves communicates with each of the through holes. By means of the present invention, a fluidization dead zone being formed in a part not provided with holes of the distribution plate can be reduced or avoided, so that the situation of sintering occurring at the bottom of a chlorination furnace when a fluidization state is poor can be avoided to a g |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2024060642A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2024060642A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2024060642A13</originalsourceid><addsrcrecordid>eNrjZDBwdwxWcPEMDgnydAoN8fT3U3BxDfN0dlVw9HNRcPbw8Q_y9HMEi7uFBvk5OrvyMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL4cH8jAyMTAzMDMxMjR0Nj4lQBAMS0Jyc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>GAS DISTRIBUTION DEVICE AND CHLORINATION FURNACE</title><source>esp@cenet</source><creator>WANG, Jianxin ; ZHOU, Li ; WANG, Dongsheng ; YE, Endong</creator><creatorcontrib>WANG, Jianxin ; ZHOU, Li ; WANG, Dongsheng ; YE, Endong</creatorcontrib><description>Disclosed are a gas distribution device and a chlorination furnace. The device comprises: a distribution plate, a plurality of through holes being formed in the distribution plate; a plurality of branch pipes, the plurality of branch pipes passing through the plurality of through holes; and a main air inlet pipe, which is arranged on the outer side of the bottom surface of the distribution plate. The plurality of branch pipes communicate with the main air inlet pipe. A plurality of grooves are formed in the top surface of the distribution plate. The size of each groove gradually decreases from a groove opening to a groove bottom. The groove bottom of each of the grooves communicates with each of the through holes. By means of the present invention, a fluidization dead zone being formed in a part not provided with holes of the distribution plate can be reduced or avoided, so that the situation of sintering occurring at the bottom of a chlorination furnace when a fluidization state is poor can be avoided to a g</description><language>chi ; eng ; fre</language><subject>BLASTING ; CHEMISTRY ; COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F ; FURNACES ; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL ; HEATING ; INORGANIC CHEMISTRY ; KILNS ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; OPEN SINTERING OR LIKE APPARATUS ; OVENS ; RETORTS ; WEAPONS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240328&DB=EPODOC&CC=WO&NR=2024060642A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240328&DB=EPODOC&CC=WO&NR=2024060642A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WANG, Jianxin</creatorcontrib><creatorcontrib>ZHOU, Li</creatorcontrib><creatorcontrib>WANG, Dongsheng</creatorcontrib><creatorcontrib>YE, Endong</creatorcontrib><title>GAS DISTRIBUTION DEVICE AND CHLORINATION FURNACE</title><description>Disclosed are a gas distribution device and a chlorination furnace. The device comprises: a distribution plate, a plurality of through holes being formed in the distribution plate; a plurality of branch pipes, the plurality of branch pipes passing through the plurality of through holes; and a main air inlet pipe, which is arranged on the outer side of the bottom surface of the distribution plate. The plurality of branch pipes communicate with the main air inlet pipe. A plurality of grooves are formed in the top surface of the distribution plate. The size of each groove gradually decreases from a groove opening to a groove bottom. The groove bottom of each of the grooves communicates with each of the through holes. By means of the present invention, a fluidization dead zone being formed in a part not provided with holes of the distribution plate can be reduced or avoided, so that the situation of sintering occurring at the bottom of a chlorination furnace when a fluidization state is poor can be avoided to a g</description><subject>BLASTING</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F</subject><subject>FURNACES</subject><subject>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</subject><subject>HEATING</subject><subject>INORGANIC CHEMISTRY</subject><subject>KILNS</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>OPEN SINTERING OR LIKE APPARATUS</subject><subject>OVENS</subject><subject>RETORTS</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBwdwxWcPEMDgnydAoN8fT3U3BxDfN0dlVw9HNRcPbw8Q_y9HMEi7uFBvk5OrvyMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL4cH8jAyMTAzMDMxMjR0Nj4lQBAMS0Jyc</recordid><startdate>20240328</startdate><enddate>20240328</enddate><creator>WANG, Jianxin</creator><creator>ZHOU, Li</creator><creator>WANG, Dongsheng</creator><creator>YE, Endong</creator><scope>EVB</scope></search><sort><creationdate>20240328</creationdate><title>GAS DISTRIBUTION DEVICE AND CHLORINATION FURNACE</title><author>WANG, Jianxin ; ZHOU, Li ; WANG, Dongsheng ; YE, Endong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2024060642A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng ; fre</language><creationdate>2024</creationdate><topic>BLASTING</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F</topic><topic>FURNACES</topic><topic>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</topic><topic>HEATING</topic><topic>INORGANIC CHEMISTRY</topic><topic>KILNS</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>OPEN SINTERING OR LIKE APPARATUS</topic><topic>OVENS</topic><topic>RETORTS</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>WANG, Jianxin</creatorcontrib><creatorcontrib>ZHOU, Li</creatorcontrib><creatorcontrib>WANG, Dongsheng</creatorcontrib><creatorcontrib>YE, Endong</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WANG, Jianxin</au><au>ZHOU, Li</au><au>WANG, Dongsheng</au><au>YE, Endong</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GAS DISTRIBUTION DEVICE AND CHLORINATION FURNACE</title><date>2024-03-28</date><risdate>2024</risdate><abstract>Disclosed are a gas distribution device and a chlorination furnace. The device comprises: a distribution plate, a plurality of through holes being formed in the distribution plate; a plurality of branch pipes, the plurality of branch pipes passing through the plurality of through holes; and a main air inlet pipe, which is arranged on the outer side of the bottom surface of the distribution plate. The plurality of branch pipes communicate with the main air inlet pipe. A plurality of grooves are formed in the top surface of the distribution plate. The size of each groove gradually decreases from a groove opening to a groove bottom. The groove bottom of each of the grooves communicates with each of the through holes. By means of the present invention, a fluidization dead zone being formed in a part not provided with holes of the distribution plate can be reduced or avoided, so that the situation of sintering occurring at the bottom of a chlorination furnace when a fluidization state is poor can be avoided to a g</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng ; fre |
| recordid | cdi_epo_espacenet_WO2024060642A1 |
| source | esp@cenet |
| subjects | BLASTING CHEMISTRY COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING INORGANIC CHEMISTRY KILNS LIGHTING MECHANICAL ENGINEERING METALLURGY OPEN SINTERING OR LIKE APPARATUS OVENS RETORTS WEAPONS |
| title | GAS DISTRIBUTION DEVICE AND CHLORINATION FURNACE |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T07%3A55%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WANG,%20Jianxin&rft.date=2024-03-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2024060642A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |