PROCESS TO DEPOSIT QUANTIZED NANO LAYERS BY MAGNETRON SPUTTERING

A process to deposit nanolaminates on a surface of a flat substrate, the process comprising the following steps : - mounting the substrate (s) in a vacuum process system on a substrate support in a peripheral region (R) of a holder, the holder being rotatable round its central axis B, the recipient...

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Bibliographische Detailangaben
Hauptverfasser:	BÄERTSCHI, Ilias Manuel, BASELGIA, Manuel, BATZER, Marietta Christina, SCHWYN THÖNY, Silvia
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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