RUTHENIUM OXIDE POWDER, COMPOSITION FOR THICK-FILM RESISTOR, PASTE FOR THICK-FILM RESISTOR, AND THICK-FILM RESISTOR
Ruthenium oxide powder according to the present invention has a rutile type crystal structure, wherein, when the a-axis lattice constant and the c-axis lattice constant measured by X-ray diffraction are La and Lc, respectively, Lc/La is 0.6913 or more, and the crystallite diameter is 10-80 nm. La po...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; jpn |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KAWAKUBO, Katsuhiro |
| description | Ruthenium oxide powder according to the present invention has a rutile type crystal structure, wherein, when the a-axis lattice constant and the c-axis lattice constant measured by X-ray diffraction are La and Lc, respectively, Lc/La is 0.6913 or more, and the crystallite diameter is 10-80 nm.
La poudre d'oxyde de ruthénium selon la présente invention a une structure cristalline de type rutile, dans laquelle, lorsque la constante de réseau d'axe a et la constante de réseau d'axe c mesurées par diffraction des rayons X sont La et Lc, respectivement, la relation Lc/La est supérieure ou égale à 0,6913, et le diamètre de cristallite est de 10 à 80 nm.
ルチル型結晶構造を有し、 Ｘ線回折法により測定したａ軸の格子定数をＬａ、ｃ軸の格子定数をＬｃとした場合にＬｃ／Ｌａが０．６９１３以上であり、 結晶子径が１０ｎｍ以上８０ｎｍ以下である酸化ルテニウム粉末。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2024024751A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2024024751A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2024024751A13</originalsourceid><addsrcrecordid>eNrjZCgOCg3xcPXzDPVV8I_wdHFVCPAPd3EN0lFw9vcN8A_2DPH091Nw8w9SCPHwdPbWdfP08VUIcg32DA7xByoKcAwOccUt7ejngk2Ch4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEh_sbGRiZAJG5qaGjoTFxqgB_cDmq</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>RUTHENIUM OXIDE POWDER, COMPOSITION FOR THICK-FILM RESISTOR, PASTE FOR THICK-FILM RESISTOR, AND THICK-FILM RESISTOR</title><source>esp@cenet</source><creator>KAWAKUBO, Katsuhiro</creator><creatorcontrib>KAWAKUBO, Katsuhiro</creatorcontrib><description>Ruthenium oxide powder according to the present invention has a rutile type crystal structure, wherein, when the a-axis lattice constant and the c-axis lattice constant measured by X-ray diffraction are La and Lc, respectively, Lc/La is 0.6913 or more, and the crystallite diameter is 10-80 nm.
La poudre d'oxyde de ruthénium selon la présente invention a une structure cristalline de type rutile, dans laquelle, lorsque la constante de réseau d'axe a et la constante de réseau d'axe c mesurées par diffraction des rayons X sont La et Lc, respectivement, la relation Lc/La est supérieure ou égale à 0,6913, et le diamètre de cristallite est de 10 à 80 nm.
ルチル型結晶構造を有し、 Ｘ線回折法により測定したａ軸の格子定数をＬａ、ｃ軸の格子定数をＬｃとした場合にＬｃ／Ｌａが０．６９１３以上であり、 結晶子径が１０ｎｍ以上８０ｎｍ以下である酸化ルテニウム粉末。</description><language>eng ; fre ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMISTRY ; COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F ; ELECTRICITY ; GLASS ; INORGANIC CHEMISTRY ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; RESISTORS ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240201&DB=EPODOC&CC=WO&NR=2024024751A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240201&DB=EPODOC&CC=WO&NR=2024024751A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWAKUBO, Katsuhiro</creatorcontrib><title>RUTHENIUM OXIDE POWDER, COMPOSITION FOR THICK-FILM RESISTOR, PASTE FOR THICK-FILM RESISTOR, AND THICK-FILM RESISTOR</title><description>Ruthenium oxide powder according to the present invention has a rutile type crystal structure, wherein, when the a-axis lattice constant and the c-axis lattice constant measured by X-ray diffraction are La and Lc, respectively, Lc/La is 0.6913 or more, and the crystallite diameter is 10-80 nm.
La poudre d'oxyde de ruthénium selon la présente invention a une structure cristalline de type rutile, dans laquelle, lorsque la constante de réseau d'axe a et la constante de réseau d'axe c mesurées par diffraction des rayons X sont La et Lc, respectivement, la relation Lc/La est supérieure ou égale à 0,6913, et le diamètre de cristallite est de 10 à 80 nm.
ルチル型結晶構造を有し、 Ｘ線回折法により測定したａ軸の格子定数をＬａ、ｃ軸の格子定数をＬｃとした場合にＬｃ／Ｌａが０．６９１３以上であり、 結晶子径が１０ｎｍ以上８０ｎｍ以下である酸化ルテニウム粉末。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F</subject><subject>ELECTRICITY</subject><subject>GLASS</subject><subject>INORGANIC CHEMISTRY</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>RESISTORS</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZCgOCg3xcPXzDPVV8I_wdHFVCPAPd3EN0lFw9vcN8A_2DPH091Nw8w9SCPHwdPbWdfP08VUIcg32DA7xByoKcAwOccUt7ejngk2Ch4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEh_sbGRiZAJG5qaGjoTFxqgB_cDmq</recordid><startdate>20240201</startdate><enddate>20240201</enddate><creator>KAWAKUBO, Katsuhiro</creator><scope>EVB</scope></search><sort><creationdate>20240201</creationdate><title>RUTHENIUM OXIDE POWDER, COMPOSITION FOR THICK-FILM RESISTOR, PASTE FOR THICK-FILM RESISTOR, AND THICK-FILM RESISTOR</title><author>KAWAKUBO, Katsuhiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2024024751A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; jpn</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F</topic><topic>ELECTRICITY</topic><topic>GLASS</topic><topic>INORGANIC CHEMISTRY</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>RESISTORS</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWAKUBO, Katsuhiro</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWAKUBO, Katsuhiro</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RUTHENIUM OXIDE POWDER, COMPOSITION FOR THICK-FILM RESISTOR, PASTE FOR THICK-FILM RESISTOR, AND THICK-FILM RESISTOR</title><date>2024-02-01</date><risdate>2024</risdate><abstract>Ruthenium oxide powder according to the present invention has a rutile type crystal structure, wherein, when the a-axis lattice constant and the c-axis lattice constant measured by X-ray diffraction are La and Lc, respectively, Lc/La is 0.6913 or more, and the crystallite diameter is 10-80 nm.
La poudre d'oxyde de ruthénium selon la présente invention a une structure cristalline de type rutile, dans laquelle, lorsque la constante de réseau d'axe a et la constante de réseau d'axe c mesurées par diffraction des rayons X sont La et Lc, respectivement, la relation Lc/La est supérieure ou égale à 0,6913, et le diamètre de cristallite est de 10 à 80 nm.
ルチル型結晶構造を有し、 Ｘ線回折法により測定したａ軸の格子定数をＬａ、ｃ軸の格子定数をＬｃとした場合にＬｃ／Ｌａが０．６９１３以上であり、 結晶子径が１０ｎｍ以上８０ｎｍ以下である酸化ルテニウム粉末。</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre ; jpn |
| recordid | cdi_epo_espacenet_WO2024024751A1 |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F ELECTRICITY GLASS INORGANIC CHEMISTRY JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL RESISTORS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS |
| title | RUTHENIUM OXIDE POWDER, COMPOSITION FOR THICK-FILM RESISTOR, PASTE FOR THICK-FILM RESISTOR, AND THICK-FILM RESISTOR |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T09%3A01%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KAWAKUBO,%20Katsuhiro&rft.date=2024-02-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2024024751A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |