LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER
Die Erfindung betrifft eine Linse für eine zum Betrieb im DUV ausgelegte mikrolitho- graphische Projektionsbelichtungsanlage, sowie ein Verfahren und eine Anordnung zum Ausbilden einer Antireflexschicht. Gemäß einem Aspekt ist bei einer erfindungs- gemäßen Linse (100) auf einem Linsensubstrat eine A...
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| description | Die Erfindung betrifft eine Linse für eine zum Betrieb im DUV ausgelegte mikrolitho- graphische Projektionsbelichtungsanlage, sowie ein Verfahren und eine Anordnung zum Ausbilden einer Antireflexschicht. Gemäß einem Aspekt ist bei einer erfindungs- gemäßen Linse (100) auf einem Linsensubstrat eine Antireflexschicht (102, 302) ausgebildet, wobei die Antireflexschicht (102, 302) ein erstes Material von relativ nied- rigerem Brechungsindex und ein zweites Material von relativ höherem Brechungs- index aufweist, und wobei ein Mischungsverhältnis zwischen dem ersten Material und dem zweiten Material in lateraler Richtung und/oder in vertikaler Richtung variiert.
The invention relates to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the case of a lens element (100) according to the invention, an antireflection layer (102, 302) is formed on a lens substrate, the antireflection layer (102, 302) comprising a first material of relatively lower refractive index and a second material of relatively higher refractive index, and a mixture ratio between the first material and the second material varying in a lateral direction and/or in a vertical direction.
L'invention concerne un élément de lentille pour un appareil d'exposition par projection microlithographique conçu pour fonctionner dans l'ultraviolet profond (DUV), ainsi qu'un procédé et un agencement pour former une couche antireflet. Selon un aspect, en ce qui concerne un élément de lentille (100) selon l'invention, une couche antireflet (102, 302) est formée sur un substrat de lentille, la couche antireflet (102, 302) comprenant un premier matériau ayant un indice de réfraction relativement inférieur et un second matériau ayant un indice de réfraction relativement supérieur, et un rapport de mélange entre le premier matériau et le second matériau variant dans un sens latéral et/ou dans un sens vertical. |
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The invention relates to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the case of a lens element (100) according to the invention, an antireflection layer (102, 302) is formed on a lens substrate, the antireflection layer (102, 302) comprising a first material of relatively lower refractive index and a second material of relatively higher refractive index, and a mixture ratio between the first material and the second material varying in a lateral direction and/or in a vertical direction.
L'invention concerne un élément de lentille pour un appareil d'exposition par projection microlithographique conçu pour fonctionner dans l'ultraviolet profond (DUV), ainsi qu'un procédé et un agencement pour former une couche antireflet. Selon un aspect, en ce qui concerne un élément de lentille (100) selon l'invention, une couche antireflet (102, 302) est formée sur un substrat de lentille, la couche antireflet (102, 302) comprenant un premier matériau ayant un indice de réfraction relativement inférieur et un second matériau ayant un indice de réfraction relativement supérieur, et un rapport de mélange entre le premier matériau et le second matériau variant dans un sens latéral et/ou dans un sens vertical.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CINEMATOGRAPHY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROGRAPHY ; HOLOGRAPHY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MATERIALS THEREFOR ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240118&DB=EPODOC&CC=WO&NR=2024012820A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240118&DB=EPODOC&CC=WO&NR=2024012820A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SIX, Stephan</creatorcontrib><title>LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER</title><description>Die Erfindung betrifft eine Linse für eine zum Betrieb im DUV ausgelegte mikrolitho- graphische Projektionsbelichtungsanlage, sowie ein Verfahren und eine Anordnung zum Ausbilden einer Antireflexschicht. Gemäß einem Aspekt ist bei einer erfindungs- gemäßen Linse (100) auf einem Linsensubstrat eine Antireflexschicht (102, 302) ausgebildet, wobei die Antireflexschicht (102, 302) ein erstes Material von relativ nied- rigerem Brechungsindex und ein zweites Material von relativ höherem Brechungs- index aufweist, und wobei ein Mischungsverhältnis zwischen dem ersten Material und dem zweiten Material in lateraler Richtung und/oder in vertikaler Richtung variiert.
The invention relates to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the case of a lens element (100) according to the invention, an antireflection layer (102, 302) is formed on a lens substrate, the antireflection layer (102, 302) comprising a first material of relatively lower refractive index and a second material of relatively higher refractive index, and a mixture ratio between the first material and the second material varying in a lateral direction and/or in a vertical direction.
L'invention concerne un élément de lentille pour un appareil d'exposition par projection microlithographique conçu pour fonctionner dans l'ultraviolet profond (DUV), ainsi qu'un procédé et un agencement pour former une couche antireflet. Selon un aspect, en ce qui concerne un élément de lentille (100) selon l'invention, une couche antireflet (102, 302) est formée sur un substrat de lentille, la couche antireflet (102, 302) comprenant un premier matériau ayant un indice de réfraction relativement inférieur et un second matériau ayant un indice de réfraction relativement supérieur, et un rapport de mélange entre le premier matériau et le second matériau variant dans un sens latéral et/ou dans un sens vertical.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNTcsKwjAQ7MWDqP-w4FWhrR68Ls22jaRJ2KY-TqVIPIkW6if5ocYieBV22WFmdmYavRTpGkhRRdpBbhgQKpmxUdKVpmC0pczAstlT5qTRQCdr6oYJ0FpkdE0NgmpZaBLju7EU2I9TanAlgWgOK0AtoKKQKEaIzKiLX2fYSuoiaGGcZMrVt07hmXgeTa7dbfCL751Fy5xcVq59_2j90HcXf_fP9mjSON3GSbpLY0w2_7neqbVGzw</recordid><startdate>20240118</startdate><enddate>20240118</enddate><creator>SIX, Stephan</creator><scope>EVB</scope></search><sort><creationdate>20240118</creationdate><title>LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER</title><author>SIX, Stephan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2024012820A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SIX, Stephan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SIX, Stephan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER</title><date>2024-01-18</date><risdate>2024</risdate><abstract>Die Erfindung betrifft eine Linse für eine zum Betrieb im DUV ausgelegte mikrolitho- graphische Projektionsbelichtungsanlage, sowie ein Verfahren und eine Anordnung zum Ausbilden einer Antireflexschicht. Gemäß einem Aspekt ist bei einer erfindungs- gemäßen Linse (100) auf einem Linsensubstrat eine Antireflexschicht (102, 302) ausgebildet, wobei die Antireflexschicht (102, 302) ein erstes Material von relativ nied- rigerem Brechungsindex und ein zweites Material von relativ höherem Brechungs- index aufweist, und wobei ein Mischungsverhältnis zwischen dem ersten Material und dem zweiten Material in lateraler Richtung und/oder in vertikaler Richtung variiert.
The invention relates to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the case of a lens element (100) according to the invention, an antireflection layer (102, 302) is formed on a lens substrate, the antireflection layer (102, 302) comprising a first material of relatively lower refractive index and a second material of relatively higher refractive index, and a mixture ratio between the first material and the second material varying in a lateral direction and/or in a vertical direction.
L'invention concerne un élément de lentille pour un appareil d'exposition par projection microlithographique conçu pour fonctionner dans l'ultraviolet profond (DUV), ainsi qu'un procédé et un agencement pour former une couche antireflet. Selon un aspect, en ce qui concerne un élément de lentille (100) selon l'invention, une couche antireflet (102, 302) est formée sur un substrat de lentille, la couche antireflet (102, 302) comprenant un premier matériau ayant un indice de réfraction relativement inférieur et un second matériau ayant un indice de réfraction relativement supérieur, et un rapport de mélange entre le premier matériau et le second matériau variant dans un sens latéral et/ou dans un sens vertical.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER |
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