ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE

Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) or both when formulated in EUV photoresists. Also disclosed are...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NGUYEN, Van, ROBINSON, Alex, JACKSON, Edward, MCCLELLAND, Alexandra, O'CALLAGHAN, Gregory, MELONI, Fernanda
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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