ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE
Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) or both when formulated in EUV photoresists. Also disclosed are...
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| creator | NGUYEN, Van ROBINSON, Alex JACKSON, Edward MCCLELLAND, Alexandra O'CALLAGHAN, Gregory MELONI, Fernanda |
| description | Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) or both when formulated in EUV photoresists. Also disclosed are formulations and processes made from the molecules disclosed.
L'invention concerne et revendique de nouvelles molécules de noyau à base aromatique non polymères contenant des fonctionnalités de réticulation, réactives à un acide ou à une base, portant de l'oxygène, avec une sensibilité (photosensibilité), une résolution (rugosité de largeur de ligne) améliorées ou les deux lorsqu'elles sont formulées dans des résines photosensibles EUV. L'invention concerne également des formulations et des procédés fabriqués à partir des molécules décrites. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2023227950A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2023227950A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2023227950A13</originalsourceid><addsrcrecordid>eNrjZDBy9fNw9HN2dVFwDQ1TCPDwD_EPcg32DA4JVnD0c1HwdQ3x8HcJVvB3UwjxcPUMUggNduVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHh_kYGRsZGRuaWpgaOhsbEqQIADSwnqw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE</title><source>esp@cenet</source><creator>NGUYEN, Van ; ROBINSON, Alex ; JACKSON, Edward ; MCCLELLAND, Alexandra ; O'CALLAGHAN, Gregory ; MELONI, Fernanda</creator><creatorcontrib>NGUYEN, Van ; ROBINSON, Alex ; JACKSON, Edward ; MCCLELLAND, Alexandra ; O'CALLAGHAN, Gregory ; MELONI, Fernanda</creatorcontrib><description>Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) or both when formulated in EUV photoresists. Also disclosed are formulations and processes made from the molecules disclosed.
L'invention concerne et revendique de nouvelles molécules de noyau à base aromatique non polymères contenant des fonctionnalités de réticulation, réactives à un acide ou à une base, portant de l'oxygène, avec une sensibilité (photosensibilité), une résolution (rugosité de largeur de ligne) améliorées ou les deux lorsqu'elles sont formulées dans des résines photosensibles EUV. L'invention concerne également des formulations et des procédés fabriqués à partir des molécules décrites.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231130&DB=EPODOC&CC=WO&NR=2023227950A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231130&DB=EPODOC&CC=WO&NR=2023227950A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NGUYEN, Van</creatorcontrib><creatorcontrib>ROBINSON, Alex</creatorcontrib><creatorcontrib>JACKSON, Edward</creatorcontrib><creatorcontrib>MCCLELLAND, Alexandra</creatorcontrib><creatorcontrib>O'CALLAGHAN, Gregory</creatorcontrib><creatorcontrib>MELONI, Fernanda</creatorcontrib><title>ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE</title><description>Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) or both when formulated in EUV photoresists. Also disclosed are formulations and processes made from the molecules disclosed.
L'invention concerne et revendique de nouvelles molécules de noyau à base aromatique non polymères contenant des fonctionnalités de réticulation, réactives à un acide ou à une base, portant de l'oxygène, avec une sensibilité (photosensibilité), une résolution (rugosité de largeur de ligne) améliorées ou les deux lorsqu'elles sont formulées dans des résines photosensibles EUV. L'invention concerne également des formulations et des procédés fabriqués à partir des molécules décrites.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBy9fNw9HN2dVFwDQ1TCPDwD_EPcg32DA4JVnD0c1HwdQ3x8HcJVvB3UwjxcPUMUggNduVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHh_kYGRsZGRuaWpgaOhsbEqQIADSwnqw</recordid><startdate>20231130</startdate><enddate>20231130</enddate><creator>NGUYEN, Van</creator><creator>ROBINSON, Alex</creator><creator>JACKSON, Edward</creator><creator>MCCLELLAND, Alexandra</creator><creator>O'CALLAGHAN, Gregory</creator><creator>MELONI, Fernanda</creator><scope>EVB</scope></search><sort><creationdate>20231130</creationdate><title>ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE</title><author>NGUYEN, Van ; ROBINSON, Alex ; JACKSON, Edward ; MCCLELLAND, Alexandra ; O'CALLAGHAN, Gregory ; MELONI, Fernanda</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2023227950A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>NGUYEN, Van</creatorcontrib><creatorcontrib>ROBINSON, Alex</creatorcontrib><creatorcontrib>JACKSON, Edward</creatorcontrib><creatorcontrib>MCCLELLAND, Alexandra</creatorcontrib><creatorcontrib>O'CALLAGHAN, Gregory</creatorcontrib><creatorcontrib>MELONI, Fernanda</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NGUYEN, Van</au><au>ROBINSON, Alex</au><au>JACKSON, Edward</au><au>MCCLELLAND, Alexandra</au><au>O'CALLAGHAN, Gregory</au><au>MELONI, Fernanda</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE</title><date>2023-11-30</date><risdate>2023</risdate><abstract>Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) or both when formulated in EUV photoresists. Also disclosed are formulations and processes made from the molecules disclosed.
L'invention concerne et revendique de nouvelles molécules de noyau à base aromatique non polymères contenant des fonctionnalités de réticulation, réactives à un acide ou à une base, portant de l'oxygène, avec une sensibilité (photosensibilité), une résolution (rugosité de largeur de ligne) améliorées ou les deux lorsqu'elles sont formulées dans des résines photosensibles EUV. L'invention concerne également des formulations et des procédés fabriqués à partir des molécules décrites.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE |
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