ENHANCED CHAMBER CLEAN AND RECOVERY WITH DUAL FLOW PATH

Processing chambers comprising a chamber body, a remote plasma source (RPS) outside the chamber body, a first connection line between the remote plasma source and the interior volume of the chamber body through the top wall and a second connection line between the remote plasma source and the interi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NARAYANAN, Prasanth, RASHEED, Muhammad M, TANAKA, Keiichi, SRIRAM, Mandyam, SANCHEZ, Mario D, SAMPATHKUMAR, Shrihari
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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