TARGET MATERIAL, HIGH-BRIGHTNESS EUV SOURCE AND METHOD FOR GENERATING EUV RADIATION

The invention relates to a Li-containing target material designed to create plasma emitting EUV radiation. The target material may be a Li-based composition with at least one further element. As an example, the further element may be selected from the groupcomprising Au, Ag, Bi, Ba, Sr. The composit...

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Bibliographische Detailangaben

Hauptverfasser:	ASTAKHOV, Dmitrii Igorevich, GLUSHKOV, Denis Aleksandrovich, KHRISTOFOROV, Oleg Borisovich, MEDVEDEV, Vyacheslav Valerievich, IVANOV, Vladimir Vitalievich, VINOKHODOV, Aleksandr Yurievich, LASH, Aleksandr Andreevich, KRIVOKORYTOV, Mikhail Sergeyevich, ELLWI, Samir, KOSHELEV, Konstantin Nikolaevich, KRIVTSUN, Vladimir Mikhailovich
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ALLOYS CHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FERROUS OR NON-FERROUS ALLOYS METALLURGY TREATMENT OF ALLOYS OR NON-FERROUS METALS X-RAY TECHNIQUE
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