DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS
The present disclosure relates to a film formed with an organometallic precursor and an organic co-reactant, as well as methods for forming and employing such films. In particular embodiments, the films can be incubated after exposure to radiation, which can provide enhanced material differences bet...
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| creator | WU, Chenghao HANSEN, Eric Calvin WEIDMAN, Timothy William |
| description | The present disclosure relates to a film formed with an organometallic precursor and an organic co-reactant, as well as methods for forming and employing such films. In particular embodiments, the films can be incubated after exposure to radiation, which can provide enhanced material differences between the exposed and unexposed regions. In non-limiting embodiments, the radiation can include extreme ultraviolet (EUV) or deep ultraviolet (DUV) radiation.
La présente invention concerne un film formé avec un précurseur organométallique et un co-réactif organique, ainsi que des procédés de formation et d'utilisation de tels films. Dans des modes de réalisation particuliers, les films peuvent être incubés après exposition à un rayonnement, ce qui permet d'obtenir des différences de matériau améliorées entre les régions exposées et non exposées. Dans des modes de réalisation non limitatifs, le rayonnement peut comprendre un rayonnement ultraviolet extrême (EUV) ou un rayonnement ultraviolet profond (DUV). |
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La présente invention concerne un film formé avec un précurseur organométallique et un co-réactif organique, ainsi que des procédés de formation et d'utilisation de tels films. Dans des modes de réalisation particuliers, les films peuvent être incubés après exposition à un rayonnement, ce qui permet d'obtenir des différences de matériau améliorées entre les régions exposées et non exposées. Dans des modes de réalisation non limitatifs, le rayonnement peut comprendre un rayonnement ultraviolet extrême (EUV) ou un rayonnement ultraviolet profond (DUV).</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230622&DB=EPODOC&CC=WO&NR=2023114724A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230622&DB=EPODOC&CC=WO&NR=2023114724A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WU, Chenghao</creatorcontrib><creatorcontrib>HANSEN, Eric Calvin</creatorcontrib><creatorcontrib>WEIDMAN, Timothy William</creatorcontrib><title>DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS</title><description>The present disclosure relates to a film formed with an organometallic precursor and an organic co-reactant, as well as methods for forming and employing such films. In particular embodiments, the films can be incubated after exposure to radiation, which can provide enhanced material differences between the exposed and unexposed regions. In non-limiting embodiments, the radiation can include extreme ultraviolet (EUV) or deep ultraviolet (DUV) radiation.
La présente invention concerne un film formé avec un précurseur organométallique et un co-réactif organique, ainsi que des procédés de formation et d'utilisation de tels films. Dans des modes de réalisation particuliers, les films peuvent être incubés après exposition à un rayonnement, ce qui permet d'obtenir des différences de matériau améliorées entre les régions exposées et non exposées. Dans des modes de réalisation non limitatifs, le rayonnement peut comprendre un rayonnement ultraviolet extrême (EUV) ou un rayonnement ultraviolet profond (DUV).</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBycQ1z9fEP8HX1C1Hwd1PwiHQK8nRR8A9yd_TzD_H0U_CP8HRxVQjw8A_xD3IN9gwOCeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHh_kYGRsaGhibmRiaOhsbEqQIAPJQoGA</recordid><startdate>20230622</startdate><enddate>20230622</enddate><creator>WU, Chenghao</creator><creator>HANSEN, Eric Calvin</creator><creator>WEIDMAN, Timothy William</creator><scope>EVB</scope></search><sort><creationdate>20230622</creationdate><title>DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS</title><author>WU, Chenghao ; HANSEN, Eric Calvin ; WEIDMAN, Timothy William</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2023114724A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WU, Chenghao</creatorcontrib><creatorcontrib>HANSEN, Eric Calvin</creatorcontrib><creatorcontrib>WEIDMAN, Timothy William</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WU, Chenghao</au><au>HANSEN, Eric Calvin</au><au>WEIDMAN, Timothy William</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS</title><date>2023-06-22</date><risdate>2023</risdate><abstract>The present disclosure relates to a film formed with an organometallic precursor and an organic co-reactant, as well as methods for forming and employing such films. In particular embodiments, the films can be incubated after exposure to radiation, which can provide enhanced material differences between the exposed and unexposed regions. In non-limiting embodiments, the radiation can include extreme ultraviolet (EUV) or deep ultraviolet (DUV) radiation.
La présente invention concerne un film formé avec un précurseur organométallique et un co-réactif organique, ainsi que des procédés de formation et d'utilisation de tels films. Dans des modes de réalisation particuliers, les films peuvent être incubés après exposition à un rayonnement, ce qui permet d'obtenir des différences de matériau améliorées entre les régions exposées et non exposées. Dans des modes de réalisation non limitatifs, le rayonnement peut comprendre un rayonnement ultraviolet extrême (EUV) ou un rayonnement ultraviolet profond (DUV).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS |
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