VALVE SYSTEMS FOR BALANCING GAS FLOW TO MULTIPLE STATIONS OF A SUBSTRATE PROCESSING SYSTEM
A substrate processing system includes N valve systems connected to N stations, respectively. Each valve system includes a manifold block, a plurality of valves, and a flow control device. The manifold block includes inlets to receive a process gas and an inert gas, an outlet connected to a station,...
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| creator | ROBERTS, Michael Philip SEETHARAMA, Bharath Kumar BLAQUIERE, Ryan |
| description | A substrate processing system includes N valve systems connected to N stations, respectively. Each valve system includes a manifold block, a plurality of valves, and a flow control device. The manifold block includes inlets to receive a process gas and an inert gas, an outlet connected to a station, and a plurality of gas flow channels disposed within the manifold block and connected to the inlets and the outlet. The valves are mounted to the manifold block and control flow of the process gas and the inert gas through the outlet. The flow control device is mounted to the manifold block and controls flow of the inert gas through the manifold block into the one of the N stations. The flow control device of each of the N valve systems is calibrated to balance the flow of the inert gas in the N stations.
Un système de traitement de substrat comprend N systèmes de soupapes connectés à N stations, respectivement. Chaque système de soupapes comprend un bloc collecteur, une pluralité de soupapes et un dispositif de commande d'écoulement. Le bloc collecteur comprend des entrées pour recevoir un gaz de traitement et un gaz inerte, une sortie connectée à une station, et une pluralité de canaux d'écoulement de gaz disposés à l'intérieur du bloc collecteur et connectés aux entrées et à la sortie. Les soupapes sont montées sur le bloc collecteur et commandent l'écoulement du gaz de traitement et du gaz inerte à travers la sortie. Le dispositif de commande d'écoulement est monté sur le bloc collecteur et commande l'écoulement du gaz inerte à travers le bloc collecteur dans l'une des N stations. Le dispositif de commande d'écoulement de chacun des N systèmes de soupapes est étalonné pour équilibrer l'écoulement du gaz inerte dans les N stations. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2023114067A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2023114067A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2023114067A13</originalsourceid><addsrcrecordid>eNqNjMEKgkAURWfTIqp_eNA6cDRq_RxGE8Z54nsqtRGJaRUl2P-TUR_Q6sDl3LNUlxZda4HPLLZkyKiGFB16U_gccpwXRx0IQdk4KSo3q4JSkGegDBC4SVlqFAtVTcYyf37f2lotbsN9CpsfV2qbWTGnXRiffZjG4Roe4dV3FEdxovU-OhxRJ_9ZbzS7Mu0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>VALVE SYSTEMS FOR BALANCING GAS FLOW TO MULTIPLE STATIONS OF A SUBSTRATE PROCESSING SYSTEM</title><source>esp@cenet</source><creator>ROBERTS, Michael Philip ; SEETHARAMA, Bharath Kumar ; BLAQUIERE, Ryan</creator><creatorcontrib>ROBERTS, Michael Philip ; SEETHARAMA, Bharath Kumar ; BLAQUIERE, Ryan</creatorcontrib><description>A substrate processing system includes N valve systems connected to N stations, respectively. Each valve system includes a manifold block, a plurality of valves, and a flow control device. The manifold block includes inlets to receive a process gas and an inert gas, an outlet connected to a station, and a plurality of gas flow channels disposed within the manifold block and connected to the inlets and the outlet. The valves are mounted to the manifold block and control flow of the process gas and the inert gas through the outlet. The flow control device is mounted to the manifold block and controls flow of the inert gas through the manifold block into the one of the N stations. The flow control device of each of the N valve systems is calibrated to balance the flow of the inert gas in the N stations.
Un système de traitement de substrat comprend N systèmes de soupapes connectés à N stations, respectivement. Chaque système de soupapes comprend un bloc collecteur, une pluralité de soupapes et un dispositif de commande d'écoulement. Le bloc collecteur comprend des entrées pour recevoir un gaz de traitement et un gaz inerte, une sortie connectée à une station, et une pluralité de canaux d'écoulement de gaz disposés à l'intérieur du bloc collecteur et connectés aux entrées et à la sortie. Les soupapes sont montées sur le bloc collecteur et commandent l'écoulement du gaz de traitement et du gaz inerte à travers la sortie. Le dispositif de commande d'écoulement est monté sur le bloc collecteur et commande l'écoulement du gaz inerte à travers le bloc collecteur dans l'une des N stations. Le dispositif de commande d'écoulement de chacun des N systèmes de soupapes est étalonné pour équilibrer l'écoulement du gaz inerte dans les N stations.</description><language>eng ; fre</language><subject>ACTUATING-FLOATS ; BASIC ELECTRIC ELEMENTS ; BLASTING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COCKS ; DEVICES FOR VENTING OR AERATING ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ENGINEERING ELEMENTS AND UNITS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TAPS ; THERMAL INSULATION IN GENERAL ; VALVES ; WEAPONS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230622&DB=EPODOC&CC=WO&NR=2023114067A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230622&DB=EPODOC&CC=WO&NR=2023114067A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ROBERTS, Michael Philip</creatorcontrib><creatorcontrib>SEETHARAMA, Bharath Kumar</creatorcontrib><creatorcontrib>BLAQUIERE, Ryan</creatorcontrib><title>VALVE SYSTEMS FOR BALANCING GAS FLOW TO MULTIPLE STATIONS OF A SUBSTRATE PROCESSING SYSTEM</title><description>A substrate processing system includes N valve systems connected to N stations, respectively. Each valve system includes a manifold block, a plurality of valves, and a flow control device. The manifold block includes inlets to receive a process gas and an inert gas, an outlet connected to a station, and a plurality of gas flow channels disposed within the manifold block and connected to the inlets and the outlet. The valves are mounted to the manifold block and control flow of the process gas and the inert gas through the outlet. The flow control device is mounted to the manifold block and controls flow of the inert gas through the manifold block into the one of the N stations. The flow control device of each of the N valve systems is calibrated to balance the flow of the inert gas in the N stations.
Un système de traitement de substrat comprend N systèmes de soupapes connectés à N stations, respectivement. Chaque système de soupapes comprend un bloc collecteur, une pluralité de soupapes et un dispositif de commande d'écoulement. Le bloc collecteur comprend des entrées pour recevoir un gaz de traitement et un gaz inerte, une sortie connectée à une station, et une pluralité de canaux d'écoulement de gaz disposés à l'intérieur du bloc collecteur et connectés aux entrées et à la sortie. Les soupapes sont montées sur le bloc collecteur et commandent l'écoulement du gaz de traitement et du gaz inerte à travers la sortie. Le dispositif de commande d'écoulement est monté sur le bloc collecteur et commande l'écoulement du gaz inerte à travers le bloc collecteur dans l'une des N stations. Le dispositif de commande d'écoulement de chacun des N systèmes de soupapes est étalonné pour équilibrer l'écoulement du gaz inerte dans les N stations.</description><subject>ACTUATING-FLOATS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COCKS</subject><subject>DEVICES FOR VENTING OR AERATING</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TAPS</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>VALVES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjMEKgkAURWfTIqp_eNA6cDRq_RxGE8Z54nsqtRGJaRUl2P-TUR_Q6sDl3LNUlxZda4HPLLZkyKiGFB16U_gccpwXRx0IQdk4KSo3q4JSkGegDBC4SVlqFAtVTcYyf37f2lotbsN9CpsfV2qbWTGnXRiffZjG4Roe4dV3FEdxovU-OhxRJ_9ZbzS7Mu0</recordid><startdate>20230622</startdate><enddate>20230622</enddate><creator>ROBERTS, Michael Philip</creator><creator>SEETHARAMA, Bharath Kumar</creator><creator>BLAQUIERE, Ryan</creator><scope>EVB</scope></search><sort><creationdate>20230622</creationdate><title>VALVE SYSTEMS FOR BALANCING GAS FLOW TO MULTIPLE STATIONS OF A SUBSTRATE PROCESSING SYSTEM</title><author>ROBERTS, Michael Philip ; SEETHARAMA, Bharath Kumar ; BLAQUIERE, Ryan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2023114067A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>ACTUATING-FLOATS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COCKS</topic><topic>DEVICES FOR VENTING OR AERATING</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TAPS</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>VALVES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>ROBERTS, Michael Philip</creatorcontrib><creatorcontrib>SEETHARAMA, Bharath Kumar</creatorcontrib><creatorcontrib>BLAQUIERE, Ryan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ROBERTS, Michael Philip</au><au>SEETHARAMA, Bharath Kumar</au><au>BLAQUIERE, Ryan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>VALVE SYSTEMS FOR BALANCING GAS FLOW TO MULTIPLE STATIONS OF A SUBSTRATE PROCESSING SYSTEM</title><date>2023-06-22</date><risdate>2023</risdate><abstract>A substrate processing system includes N valve systems connected to N stations, respectively. Each valve system includes a manifold block, a plurality of valves, and a flow control device. The manifold block includes inlets to receive a process gas and an inert gas, an outlet connected to a station, and a plurality of gas flow channels disposed within the manifold block and connected to the inlets and the outlet. The valves are mounted to the manifold block and control flow of the process gas and the inert gas through the outlet. The flow control device is mounted to the manifold block and controls flow of the inert gas through the manifold block into the one of the N stations. The flow control device of each of the N valve systems is calibrated to balance the flow of the inert gas in the N stations.
Un système de traitement de substrat comprend N systèmes de soupapes connectés à N stations, respectivement. Chaque système de soupapes comprend un bloc collecteur, une pluralité de soupapes et un dispositif de commande d'écoulement. Le bloc collecteur comprend des entrées pour recevoir un gaz de traitement et un gaz inerte, une sortie connectée à une station, et une pluralité de canaux d'écoulement de gaz disposés à l'intérieur du bloc collecteur et connectés aux entrées et à la sortie. Les soupapes sont montées sur le bloc collecteur et commandent l'écoulement du gaz de traitement et du gaz inerte à travers la sortie. Le dispositif de commande d'écoulement est monté sur le bloc collecteur et commande l'écoulement du gaz inerte à travers le bloc collecteur dans l'une des N stations. Le dispositif de commande d'écoulement de chacun des N systèmes de soupapes est étalonné pour équilibrer l'écoulement du gaz inerte dans les N stations.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACTUATING-FLOATS BASIC ELECTRIC ELEMENTS BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COCKS DEVICES FOR VENTING OR AERATING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TAPS THERMAL INSULATION IN GENERAL VALVES WEAPONS |
| title | VALVE SYSTEMS FOR BALANCING GAS FLOW TO MULTIPLE STATIONS OF A SUBSTRATE PROCESSING SYSTEM |
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