AMORPHOUS TRANSPARENT CONDUCTIVE OXIDE FILMS AND METHODS OF FABRICATING THE SAME

A composite includes a substrate and a target material, wherein the target material includes indium oxide (In2O3), tin oxide (SnO2), and gallium oxide (Ga2O3), and a method for making the same. The method includes positioning the substrate and a target in a chamber and applying radio frequency (RF)...

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Hauptverfasser:	DAINESE, JR, MANLEY, Robert George, ZHU, Bin, JIANG, Wei
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS METALLURGY SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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creator	DAINESE, JR MANLEY, Robert George ZHU, Bin JIANG, Wei
description	A composite includes a substrate and a target material, wherein the target material includes indium oxide (In2O3), tin oxide (SnO2), and gallium oxide (Ga2O3), and a method for making the same. The method includes positioning the substrate and a target in a chamber and applying radio frequency (RF) power to the chamber to sputter ions of target material from the target onto the substrate. Un composite comprend un substrat et un matériau cible, le matériau cible comprenant de l'oxyde d'indium (In2O3), de l'oxyde d'étain (SnO2) et de l'oxyde de gallium (Ga2O3), ainsi qu'un procédé de fabrication s'y rapportant. Le procédé comprend le positionnement du substrat et d'une cible dans une chambre et l'application d'une puissance radioélectrique (RF) à la chambre pour pulvériser des ions de matériau cible de la cible sur le substrat.
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fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2023091330A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2023091330A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2023091330A13</originalsourceid><addsrcrecordid>eNqNyrEKwjAQANAuDqL-w4Gz0DaT45lcTMDkSnKtbqVInEQL9f9x8QOc3vLWVYeBU-e4zyAJY-4wURTQHE2vxQ8EfPOGwPpLyIDRQCBxbDKwBYun5DWKj2cQR5Ax0LZaPabnUnY_N9Xekmh3KPN7LMs83curfMYrt3Wr6mOjVI2N-m99AUO1L-o</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>AMORPHOUS TRANSPARENT CONDUCTIVE OXIDE FILMS AND METHODS OF FABRICATING THE SAME</title><source>esp@cenet</source><creator>DAINESE, JR ; MANLEY, Robert George ; ZHU, Bin ; JIANG, Wei</creator><creatorcontrib>DAINESE, JR ; MANLEY, Robert George ; ZHU, Bin ; JIANG, Wei</creatorcontrib><description>A composite includes a substrate and a target material, wherein the target material includes indium oxide (In2O3), tin oxide (SnO2), and gallium oxide (Ga2O3), and a method for making the same. The method includes positioning the substrate and a target in a chamber and applying radio frequency (RF) power to the chamber to sputter ions of target material from the target onto the substrate. Un composite comprend un substrat et un matériau cible, le matériau cible comprenant de l'oxyde d'indium (In2O3), de l'oxyde d'étain (SnO2) et de l'oxyde de gallium (Ga2O3), ainsi qu'un procédé de fabrication s'y rapportant. Le procédé comprend le positionnement du substrat et d'une cible dans une chambre et l'application d'une puissance radioélectrique (RF) à la chambre pour pulvériser des ions de matériau cible de la cible sur le substrat.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; CABLES ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CONDUCTORS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INSULATORS ; METALLURGY ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230525&DB=EPODOC&CC=WO&NR=2023091330A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230525&DB=EPODOC&CC=WO&NR=2023091330A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DAINESE, JR</creatorcontrib><creatorcontrib>MANLEY, Robert George</creatorcontrib><creatorcontrib>ZHU, Bin</creatorcontrib><creatorcontrib>JIANG, Wei</creatorcontrib><title>AMORPHOUS TRANSPARENT CONDUCTIVE OXIDE FILMS AND METHODS OF FABRICATING THE SAME</title><description>A composite includes a substrate and a target material, wherein the target material includes indium oxide (In2O3), tin oxide (SnO2), and gallium oxide (Ga2O3), and a method for making the same. The method includes positioning the substrate and a target in a chamber and applying radio frequency (RF) power to the chamber to sputter ions of target material from the target onto the substrate. Un composite comprend un substrat et un matériau cible, le matériau cible comprenant de l'oxyde d'indium (In2O3), de l'oxyde d'étain (SnO2) et de l'oxyde de gallium (Ga2O3), ainsi qu'un procédé de fabrication s'y rapportant. Le procédé comprend le positionnement du substrat et d'une cible dans une chambre et l'application d'une puissance radioélectrique (RF) à la chambre pour pulvériser des ions de matériau cible de la cible sur le substrat.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CABLES</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CONDUCTORS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INSULATORS</subject><subject>METALLURGY</subject><subject>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwjAQANAuDqL-w4Gz0DaT45lcTMDkSnKtbqVInEQL9f9x8QOc3vLWVYeBU-e4zyAJY-4wURTQHE2vxQ8EfPOGwPpLyIDRQCBxbDKwBYun5DWKj2cQR5Ax0LZaPabnUnY_N9Xekmh3KPN7LMs83curfMYrt3Wr6mOjVI2N-m99AUO1L-o</recordid><startdate>20230525</startdate><enddate>20230525</enddate><creator>DAINESE, JR</creator><creator>MANLEY, Robert George</creator><creator>ZHU, Bin</creator><creator>JIANG, Wei</creator><scope>EVB</scope></search><sort><creationdate>20230525</creationdate><title>AMORPHOUS TRANSPARENT CONDUCTIVE OXIDE FILMS AND METHODS OF FABRICATING THE SAME</title><author>DAINESE, JR ; MANLEY, Robert George ; ZHU, Bin ; JIANG, Wei</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2023091330A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CABLES</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CONDUCTORS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INSULATORS</topic><topic>METALLURGY</topic><topic>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>DAINESE, JR</creatorcontrib><creatorcontrib>MANLEY, Robert George</creatorcontrib><creatorcontrib>ZHU, Bin</creatorcontrib><creatorcontrib>JIANG, Wei</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DAINESE, JR</au><au>MANLEY, Robert George</au><au>ZHU, Bin</au><au>JIANG, Wei</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>AMORPHOUS TRANSPARENT CONDUCTIVE OXIDE FILMS AND METHODS OF FABRICATING THE SAME</title><date>2023-05-25</date><risdate>2023</risdate><abstract>A composite includes a substrate and a target material, wherein the target material includes indium oxide (In2O3), tin oxide (SnO2), and gallium oxide (Ga2O3), and a method for making the same. The method includes positioning the substrate and a target in a chamber and applying radio frequency (RF) power to the chamber to sputter ions of target material from the target onto the substrate. Un composite comprend un substrat et un matériau cible, le matériau cible comprenant de l'oxyde d'indium (In2O3), de l'oxyde d'étain (SnO2) et de l'oxyde de gallium (Ga2O3), ainsi qu'un procédé de fabrication s'y rapportant. Le procédé comprend le positionnement du substrat et d'une cible dans une chambre et l'application d'une puissance radioélectrique (RF) à la chambre pour pulvériser des ions de matériau cible de la cible sur le substrat.</abstract><oa>free_for_read</oa></addata></record>
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language	eng ; fre
recordid	cdi_epo_espacenet_WO2023091330A1
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subjects	BASIC ELECTRIC ELEMENTS CABLES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS METALLURGY SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title	AMORPHOUS TRANSPARENT CONDUCTIVE OXIDE FILMS AND METHODS OF FABRICATING THE SAME
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T23%3A19%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=DAINESE,%20JR&rft.date=2023-05-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2023091330A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true