VACUUM PROCESSING SYSTEM, APPARATUS AND METHOD FOR TRANSPORTING A THIN FILM SUBSTRATE
An apparatus (10) for transportation of a thin film substrate (12) under vacuum conditions is described. The apparatus (10) for transportation includes a rotatable roller (100) with a substrate facing surface (102) including a first substrate facing surface portion (104), wherein the substrate facin...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | SCHNAPPENBERGER, Frank |
| description | An apparatus (10) for transportation of a thin film substrate (12) under vacuum conditions is described. The apparatus (10) for transportation includes a rotatable roller (100) with a substrate facing surface (102) including a first substrate facing surface portion (104), wherein the substrate facing surface (102) includes one or more gas outlets (105), wherein the one or more gas outlets are configured for releasing a gas flow and the roller includes a deposition region (106) and at least one non-deposition region (108). The apparatus further includes a gas distribution system (400) for providing the gas flow through the one or more gas outlets (105) into an interspace between the thin film substrate (12) and the first substrate facing surface portion (104), and a sealing belt conveyor system (120) including one or more sealing belts (122) provided at the at least one non-deposition region (108).
L'invention décrit un appareil (10) de transport d'un substrat à film mince (12) dans des conditions de vide. L'appareil (10) destiné au transport comprend un rouleau rotatif (100) possédant une surface (102) faisant face au substrat comprenant une première partie (104) de surface faisant face au substrat, la surface (102) faisant face au substrat comprend une ou plusieurs sorties de gaz (105), la ou les sorties de gaz étant configurées pour libérer un flux de gaz et le rouleau comprenant une région de dépôt (106) et au moins une région de non-dépôt (108). L'appareil comprend en outre un système de distribution de gaz (400) servant à alimenter le flux de gaz à travers la ou les sorties de gaz (105) dans un espace intermédiaire entre le substrat de film mince (12) et la première partie (104) de surface faisant face au substrat, et un système transporteur à courroie d'étanchéité (120) comprenant une ou plusieurs courroies d'étanchéité (122) disposées au niveau de la ou des régions de non-dépôt (108). |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2023072371A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2023072371A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2023072371A13</originalsourceid><addsrcrecordid>eNqNyr0KwjAUQOEsDqK-wwVXhTYdOl_bxBTMD7k3FadSJE6ihfr-qOADOJ3hfEuRemxSshCibxRR545AF2Jld4AhYEROBOhasIqNb0H7CBzRUfCRvxqBTedAdycLlA70mazWYnEb73Pe_LoSW624Mfs8PYc8T-M1P_JrOHtZyKqoZVWXWFb_qTdJrzGR</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>VACUUM PROCESSING SYSTEM, APPARATUS AND METHOD FOR TRANSPORTING A THIN FILM SUBSTRATE</title><source>esp@cenet</source><creator>SCHNAPPENBERGER, Frank</creator><creatorcontrib>SCHNAPPENBERGER, Frank</creatorcontrib><description>An apparatus (10) for transportation of a thin film substrate (12) under vacuum conditions is described. The apparatus (10) for transportation includes a rotatable roller (100) with a substrate facing surface (102) including a first substrate facing surface portion (104), wherein the substrate facing surface (102) includes one or more gas outlets (105), wherein the one or more gas outlets are configured for releasing a gas flow and the roller includes a deposition region (106) and at least one non-deposition region (108). The apparatus further includes a gas distribution system (400) for providing the gas flow through the one or more gas outlets (105) into an interspace between the thin film substrate (12) and the first substrate facing surface portion (104), and a sealing belt conveyor system (120) including one or more sealing belts (122) provided at the at least one non-deposition region (108).
L'invention décrit un appareil (10) de transport d'un substrat à film mince (12) dans des conditions de vide. L'appareil (10) destiné au transport comprend un rouleau rotatif (100) possédant une surface (102) faisant face au substrat comprenant une première partie (104) de surface faisant face au substrat, la surface (102) faisant face au substrat comprend une ou plusieurs sorties de gaz (105), la ou les sorties de gaz étant configurées pour libérer un flux de gaz et le rouleau comprenant une région de dépôt (106) et au moins une région de non-dépôt (108). L'appareil comprend en outre un système de distribution de gaz (400) servant à alimenter le flux de gaz à travers la ou les sorties de gaz (105) dans un espace intermédiaire entre le substrat de film mince (12) et la première partie (104) de surface faisant face au substrat, et un système transporteur à courroie d'étanchéité (120) comprenant une ou plusieurs courroies d'étanchéité (122) disposées au niveau de la ou des régions de non-dépôt (108).</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230504&DB=EPODOC&CC=WO&NR=2023072371A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230504&DB=EPODOC&CC=WO&NR=2023072371A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHNAPPENBERGER, Frank</creatorcontrib><title>VACUUM PROCESSING SYSTEM, APPARATUS AND METHOD FOR TRANSPORTING A THIN FILM SUBSTRATE</title><description>An apparatus (10) for transportation of a thin film substrate (12) under vacuum conditions is described. The apparatus (10) for transportation includes a rotatable roller (100) with a substrate facing surface (102) including a first substrate facing surface portion (104), wherein the substrate facing surface (102) includes one or more gas outlets (105), wherein the one or more gas outlets are configured for releasing a gas flow and the roller includes a deposition region (106) and at least one non-deposition region (108). The apparatus further includes a gas distribution system (400) for providing the gas flow through the one or more gas outlets (105) into an interspace between the thin film substrate (12) and the first substrate facing surface portion (104), and a sealing belt conveyor system (120) including one or more sealing belts (122) provided at the at least one non-deposition region (108).
L'invention décrit un appareil (10) de transport d'un substrat à film mince (12) dans des conditions de vide. L'appareil (10) destiné au transport comprend un rouleau rotatif (100) possédant une surface (102) faisant face au substrat comprenant une première partie (104) de surface faisant face au substrat, la surface (102) faisant face au substrat comprend une ou plusieurs sorties de gaz (105), la ou les sorties de gaz étant configurées pour libérer un flux de gaz et le rouleau comprenant une région de dépôt (106) et au moins une région de non-dépôt (108). L'appareil comprend en outre un système de distribution de gaz (400) servant à alimenter le flux de gaz à travers la ou les sorties de gaz (105) dans un espace intermédiaire entre le substrat de film mince (12) et la première partie (104) de surface faisant face au substrat, et un système transporteur à courroie d'étanchéité (120) comprenant une ou plusieurs courroies d'étanchéité (122) disposées au niveau de la ou des régions de non-dépôt (108).</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyr0KwjAUQOEsDqK-wwVXhTYdOl_bxBTMD7k3FadSJE6ihfr-qOADOJ3hfEuRemxSshCibxRR545AF2Jld4AhYEROBOhasIqNb0H7CBzRUfCRvxqBTedAdycLlA70mazWYnEb73Pe_LoSW624Mfs8PYc8T-M1P_JrOHtZyKqoZVWXWFb_qTdJrzGR</recordid><startdate>20230504</startdate><enddate>20230504</enddate><creator>SCHNAPPENBERGER, Frank</creator><scope>EVB</scope></search><sort><creationdate>20230504</creationdate><title>VACUUM PROCESSING SYSTEM, APPARATUS AND METHOD FOR TRANSPORTING A THIN FILM SUBSTRATE</title><author>SCHNAPPENBERGER, Frank</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2023072371A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHNAPPENBERGER, Frank</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHNAPPENBERGER, Frank</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>VACUUM PROCESSING SYSTEM, APPARATUS AND METHOD FOR TRANSPORTING A THIN FILM SUBSTRATE</title><date>2023-05-04</date><risdate>2023</risdate><abstract>An apparatus (10) for transportation of a thin film substrate (12) under vacuum conditions is described. The apparatus (10) for transportation includes a rotatable roller (100) with a substrate facing surface (102) including a first substrate facing surface portion (104), wherein the substrate facing surface (102) includes one or more gas outlets (105), wherein the one or more gas outlets are configured for releasing a gas flow and the roller includes a deposition region (106) and at least one non-deposition region (108). The apparatus further includes a gas distribution system (400) for providing the gas flow through the one or more gas outlets (105) into an interspace between the thin film substrate (12) and the first substrate facing surface portion (104), and a sealing belt conveyor system (120) including one or more sealing belts (122) provided at the at least one non-deposition region (108).
L'invention décrit un appareil (10) de transport d'un substrat à film mince (12) dans des conditions de vide. L'appareil (10) destiné au transport comprend un rouleau rotatif (100) possédant une surface (102) faisant face au substrat comprenant une première partie (104) de surface faisant face au substrat, la surface (102) faisant face au substrat comprend une ou plusieurs sorties de gaz (105), la ou les sorties de gaz étant configurées pour libérer un flux de gaz et le rouleau comprenant une région de dépôt (106) et au moins une région de non-dépôt (108). L'appareil comprend en outre un système de distribution de gaz (400) servant à alimenter le flux de gaz à travers la ou les sorties de gaz (105) dans un espace intermédiaire entre le substrat de film mince (12) et la première partie (104) de surface faisant face au substrat, et un système transporteur à courroie d'étanchéité (120) comprenant une ou plusieurs courroies d'étanchéité (122) disposées au niveau de la ou des régions de non-dépôt (108).</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre |
| recordid | cdi_epo_espacenet_WO2023072371A1 |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | VACUUM PROCESSING SYSTEM, APPARATUS AND METHOD FOR TRANSPORTING A THIN FILM SUBSTRATE |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T08%3A42%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SCHNAPPENBERGER,%20Frank&rft.date=2023-05-04&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2023072371A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |