SHOWERHEAD TEMPERATURE BASED DEPOSITION TIME COMPENSATION FOR THICKNESS TRENDING IN PECVD DEPOSITION SYSTEM

A controller for a processing chamber configured to perform a deposition process on a substrate comprises a temperature monitor configured to obtain a temperature of a showerhead of the processing chamber, a deposition time determiner configured to determine an optimized deposition time based on the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MULLENAUX, Sky, HONG, Tu, SHEN, Wenjia, KANG, Hu, KOLLRACK, Marc, WANG, Dong
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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