CONFORMAL YTTRIUM OXIDE COATING
Exemplary methods of coating a semiconductor component substrate may include submerging the semiconductor component substrate in an alkaline electrolyte. The alkaline electrolyte may include yttrium. The methods may include igniting a plasma at a surface of the semiconductor component substrate for...
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| creator | NOVAK, Michelle Lacomb KAUSHAL, Tony S |
| description | Exemplary methods of coating a semiconductor component substrate may include submerging the semiconductor component substrate in an alkaline electrolyte. The alkaline electrolyte may include yttrium. The methods may include igniting a plasma at a surface of the semiconductor component substrate for a period of time less than or about 12 hours. The methods may include forming a yttrium-containing oxide on the semiconductor component substrate. A surface of the yttrium-containing oxide may be characterized by a yttrium incorporation of greater than or about 10 at.%.
Des exemples de procédés de revêtement d'un substrat de composant semi-conducteur peuvent comprendre l'immersion du substrat de composant semi-conducteur dans un électrolyte alcalin. L'électrolyte alcalin peut comprendre de l'yttrium. Les procédés peuvent comprendre l'allumage d'un plasma au niveau d'une surface du substrat de composant semi-conducteur pendant une durée inférieure ou égale à environ 12 heures. Les procédés peuvent comprendre la formation d'un oxyde contenant de l'yttrium sur le substrat de composant semi-conducteur. Une surface de l'oxyde contenant de l'yttrium peut être caractérisée par une incorporation d'yttrium supérieure ou égale à environ 10 % en pourcentage atomique. |
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Des exemples de procédés de revêtement d'un substrat de composant semi-conducteur peuvent comprendre l'immersion du substrat de composant semi-conducteur dans un électrolyte alcalin. L'électrolyte alcalin peut comprendre de l'yttrium. Les procédés peuvent comprendre l'allumage d'un plasma au niveau d'une surface du substrat de composant semi-conducteur pendant une durée inférieure ou égale à environ 12 heures. Les procédés peuvent comprendre la formation d'un oxyde contenant de l'yttrium sur le substrat de composant semi-conducteur. Une surface de l'oxyde contenant de l'yttrium peut être caractérisée par une incorporation d'yttrium supérieure ou égale à environ 10 % en pourcentage atomique.</description><language>eng ; fre</language><subject>APPARATUS THEREFOR ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221222&DB=EPODOC&CC=WO&NR=2022265858A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221222&DB=EPODOC&CC=WO&NR=2022265858A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NOVAK, Michelle Lacomb</creatorcontrib><creatorcontrib>KAUSHAL, Tony S</creatorcontrib><title>CONFORMAL YTTRIUM OXIDE COATING</title><description>Exemplary methods of coating a semiconductor component substrate may include submerging the semiconductor component substrate in an alkaline electrolyte. The alkaline electrolyte may include yttrium. The methods may include igniting a plasma at a surface of the semiconductor component substrate for a period of time less than or about 12 hours. The methods may include forming a yttrium-containing oxide on the semiconductor component substrate. A surface of the yttrium-containing oxide may be characterized by a yttrium incorporation of greater than or about 10 at.%.
Des exemples de procédés de revêtement d'un substrat de composant semi-conducteur peuvent comprendre l'immersion du substrat de composant semi-conducteur dans un électrolyte alcalin. L'électrolyte alcalin peut comprendre de l'yttrium. Les procédés peuvent comprendre l'allumage d'un plasma au niveau d'une surface du substrat de composant semi-conducteur pendant une durée inférieure ou égale à environ 12 heures. Les procédés peuvent comprendre la formation d'un oxyde contenant de l'yttrium sur le substrat de composant semi-conducteur. Une surface de l'oxyde contenant de l'yttrium peut être caractérisée par une incorporation d'yttrium supérieure ou égale à environ 10 % en pourcentage atomique.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJB39vdz8w_ydfRRiAwJCfIM9VXwj_B0cVVw9ncM8fRz52FgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgZGRkZmphamFo6GxsSpAgBuVSLD</recordid><startdate>20221222</startdate><enddate>20221222</enddate><creator>NOVAK, Michelle Lacomb</creator><creator>KAUSHAL, Tony S</creator><scope>EVB</scope></search><sort><creationdate>20221222</creationdate><title>CONFORMAL YTTRIUM OXIDE COATING</title><author>NOVAK, Michelle Lacomb ; KAUSHAL, Tony S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2022265858A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2022</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>NOVAK, Michelle Lacomb</creatorcontrib><creatorcontrib>KAUSHAL, Tony S</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NOVAK, Michelle Lacomb</au><au>KAUSHAL, Tony S</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CONFORMAL YTTRIUM OXIDE COATING</title><date>2022-12-22</date><risdate>2022</risdate><abstract>Exemplary methods of coating a semiconductor component substrate may include submerging the semiconductor component substrate in an alkaline electrolyte. The alkaline electrolyte may include yttrium. The methods may include igniting a plasma at a surface of the semiconductor component substrate for a period of time less than or about 12 hours. The methods may include forming a yttrium-containing oxide on the semiconductor component substrate. A surface of the yttrium-containing oxide may be characterized by a yttrium incorporation of greater than or about 10 at.%.
Des exemples de procédés de revêtement d'un substrat de composant semi-conducteur peuvent comprendre l'immersion du substrat de composant semi-conducteur dans un électrolyte alcalin. L'électrolyte alcalin peut comprendre de l'yttrium. Les procédés peuvent comprendre l'allumage d'un plasma au niveau d'une surface du substrat de composant semi-conducteur pendant une durée inférieure ou égale à environ 12 heures. Les procédés peuvent comprendre la formation d'un oxyde contenant de l'yttrium sur le substrat de composant semi-conducteur. Une surface de l'oxyde contenant de l'yttrium peut être caractérisée par une incorporation d'yttrium supérieure ou égale à environ 10 % en pourcentage atomique.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | CONFORMAL YTTRIUM OXIDE COATING |
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