DECOMPOSING/CLEANING COMPOSITION, METHOD FOR PRODUCING SAME, AND METHOD FOR CLEANING ADHESIVE POLYMER

Provided is a decomposing/cleaning composition having a high etching speed. The decomposing/cleaning composition contains: (A) an N-substituted amide compound, in which 2 alkyl groups are bonded to an amide nitrogen atom, as an aprotic solvent; and (B) a quaternary ammonium alkyl fluoride or a hydra...

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Hauptverfasser:	MIYAHARA, Kuniaki, NAKAZAKI, Susumu
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CLEANING CLEANING IN GENERAL DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING TRANSPORTING USE OF SINGLE SUBSTANCES AS DETERGENTS
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creator	MIYAHARA, Kuniaki NAKAZAKI, Susumu
description	Provided is a decomposing/cleaning composition having a high etching speed. The decomposing/cleaning composition contains: (A) an N-substituted amide compound, in which 2 alkyl groups are bonded to an amide nitrogen atom, as an aprotic solvent; and (B) a quaternary ammonium alkyl fluoride or a hydrate thereof. The content of an N-substituted amide acid derivative, which is a compound in which 2 hydrogen atoms on a carbon atom at the α-position of the amide nitrogen atom of the N-substituted amide compound (A) are substituted with oxo groups, is 550 ppm by mass or less. L'invention concerne une composition de décomposition/nettoyage ayant une vitesse de gravure élevée. La composition de décomposition/nettoyage contient : (A) un composé amide N-substitué, dans lequel 2 groupes alkyle sont liés à un atome d'azote amide, en tant que solvant aprotique ; et (B) un fluorure d'alkyle d'ammonium quaternaire ou un hydrate de celui-ci. La teneur en dérivé d'acide amidique N-substitué, qui est un composé dans lequel 2 atomes d'hydrogène sur un atome de carbone en position α de l'atome d'azote amidique du composé amidique N-substitué (A) sont substitués par des groupes oxo, est inférieure ou égale à 550 ppm en masse. 高いエッチング速度を示す分解洗浄組成物の提供。非プロトン性溶媒として（Ａ）アミド窒素原子に２つのアルキル基が結合したＮ－置換アミド化合物、及び（Ｂ）第四級フッ化アルキルアンモニウム又はその水和物を含有する分解洗浄組成物であって、（Ａ）Ｎ－置換アミド化合物のアミド窒素原子のα位にある炭素原子上の２個の水素原子がオキソ基で置換された化合物であるＮ－置換アミド酸化誘導体の含有量が、５５０質量ｐｐｍ以下である、分解洗浄組成物。
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The decomposing/cleaning composition contains: (A) an N-substituted amide compound, in which 2 alkyl groups are bonded to an amide nitrogen atom, as an aprotic solvent; and (B) a quaternary ammonium alkyl fluoride or a hydrate thereof. The content of an N-substituted amide acid derivative, which is a compound in which 2 hydrogen atoms on a carbon atom at the α-position of the amide nitrogen atom of the N-substituted amide compound (A) are substituted with oxo groups, is 550 ppm by mass or less. L'invention concerne une composition de décomposition/nettoyage ayant une vitesse de gravure élevée. La composition de décomposition/nettoyage contient : (A) un composé amide N-substitué, dans lequel 2 groupes alkyle sont liés à un atome d'azote amide, en tant que solvant aprotique ; et (B) un fluorure d'alkyle d'ammonium quaternaire ou un hydrate de celui-ci. La teneur en dérivé d'acide amidique N-substitué, qui est un composé dans lequel 2 atomes d'hydrogène sur un atome de carbone en position α de l'atome d'azote amidique du composé amidique N-substitué (A) sont substitués par des groupes oxo, est inférieure ou égale à 550 ppm en masse. 高いエッチング速度を示す分解洗浄組成物の提供。非プロトン性溶媒として（Ａ）アミド窒素原子に２つのアルキル基が結合したＮ－置換アミド化合物、及び（Ｂ）第四級フッ化アルキルアンモニウム又はその水和物を含有する分解洗浄組成物であって、（Ａ）Ｎ－置換アミド化合物のアミド窒素原子のα位にある炭素原子上の２個の水素原子がオキソ基で置換された化合物であるＮ－置換アミド酸化誘導体の含有量が、５５０質量ｐｐｍ以下である、分解洗浄組成物。</description><language>eng ; fre ; jpn</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; BASIC ELECTRIC ELEMENTS ; CANDLES ; CHEMISTRY ; CLEANING ; CLEANING IN GENERAL ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FATTY ACIDS THEREFROM ; METALLURGY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SEMICONDUCTOR DEVICES ; SOAP OR SOAP-MAKING ; TRANSPORTING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221124&DB=EPODOC&CC=WO&NR=2022244593A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221124&DB=EPODOC&CC=WO&NR=2022244593A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAHARA, Kuniaki</creatorcontrib><creatorcontrib>NAKAZAKI, Susumu</creatorcontrib><title>DECOMPOSING/CLEANING COMPOSITION, METHOD FOR PRODUCING SAME, AND METHOD FOR CLEANING ADHESIVE POLYMER</title><description>Provided is a decomposing/cleaning composition having a high etching speed. The decomposing/cleaning composition contains: (A) an N-substituted amide compound, in which 2 alkyl groups are bonded to an amide nitrogen atom, as an aprotic solvent; and (B) a quaternary ammonium alkyl fluoride or a hydrate thereof. The content of an N-substituted amide acid derivative, which is a compound in which 2 hydrogen atoms on a carbon atom at the α-position of the amide nitrogen atom of the N-substituted amide compound (A) are substituted with oxo groups, is 550 ppm by mass or less. L'invention concerne une composition de décomposition/nettoyage ayant une vitesse de gravure élevée. La composition de décomposition/nettoyage contient : (A) un composé amide N-substitué, dans lequel 2 groupes alkyle sont liés à un atome d'azote amide, en tant que solvant aprotique ; et (B) un fluorure d'alkyle d'ammonium quaternaire ou un hydrate de celui-ci. La teneur en dérivé d'acide amidique N-substitué, qui est un composé dans lequel 2 atomes d'hydrogène sur un atome de carbone en position α de l'atome d'azote amidique du composé amidique N-substitué (A) sont substitués par des groupes oxo, est inférieure ou égale à 550 ppm en masse. 高いエッチング速度を示す分解洗浄組成物の提供。非プロトン性溶媒として（Ａ）アミド窒素原子に２つのアルキル基が結合したＮ－置換アミド化合物、及び（Ｂ）第四級フッ化アルキルアンモニウム又はその水和物を含有する分解洗浄組成物であって、（Ａ）Ｎ－置換アミド化合物のアミド窒素原子のα位にある炭素原子上の２個の水素原子がオキソ基で置換された化合物であるＮ－置換アミド酸化誘導体の含有量が、５５０質量ｐｐｍ以下である、分解洗浄組成物。</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOAP OR SOAP-MAKING</subject><subject>TRANSPORTING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEh1cXX29w3wD_b0c9d39nF19AMyFKBCIZ7-fjoKvq4hHv4uCm7-QQoBQf4uoc4gFcGOvq46Co5-LsjScP2OLh6uwZ5hrgoB_j6Rvq5BPAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7UkPtzfyMDIyMjExNTS2NHQmDhVAExpNZg</recordid><startdate>20221124</startdate><enddate>20221124</enddate><creator>MIYAHARA, Kuniaki</creator><creator>NAKAZAKI, Susumu</creator><scope>EVB</scope></search><sort><creationdate>20221124</creationdate><title>DECOMPOSING/CLEANING COMPOSITION, METHOD FOR PRODUCING SAME, AND METHOD FOR CLEANING ADHESIVE POLYMER</title><author>MIYAHARA, Kuniaki ; NAKAZAKI, Susumu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2022244593A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; jpn</language><creationdate>2022</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOAP OR SOAP-MAKING</topic><topic>TRANSPORTING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAHARA, Kuniaki</creatorcontrib><creatorcontrib>NAKAZAKI, Susumu</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAHARA, Kuniaki</au><au>NAKAZAKI, Susumu</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DECOMPOSING/CLEANING COMPOSITION, METHOD FOR PRODUCING SAME, AND METHOD FOR CLEANING ADHESIVE POLYMER</title><date>2022-11-24</date><risdate>2022</risdate><abstract>Provided is a decomposing/cleaning composition having a high etching speed. The decomposing/cleaning composition contains: (A) an N-substituted amide compound, in which 2 alkyl groups are bonded to an amide nitrogen atom, as an aprotic solvent; and (B) a quaternary ammonium alkyl fluoride or a hydrate thereof. The content of an N-substituted amide acid derivative, which is a compound in which 2 hydrogen atoms on a carbon atom at the α-position of the amide nitrogen atom of the N-substituted amide compound (A) are substituted with oxo groups, is 550 ppm by mass or less. L'invention concerne une composition de décomposition/nettoyage ayant une vitesse de gravure élevée. La composition de décomposition/nettoyage contient : (A) un composé amide N-substitué, dans lequel 2 groupes alkyle sont liés à un atome d'azote amide, en tant que solvant aprotique ; et (B) un fluorure d'alkyle d'ammonium quaternaire ou un hydrate de celui-ci. La teneur en dérivé d'acide amidique N-substitué, qui est un composé dans lequel 2 atomes d'hydrogène sur un atome de carbone en position α de l'atome d'azote amidique du composé amidique N-substitué (A) sont substitués par des groupes oxo, est inférieure ou égale à 550 ppm en masse. 高いエッチング速度を示す分解洗浄組成物の提供。非プロトン性溶媒として（Ａ）アミド窒素原子に２つのアルキル基が結合したＮ－置換アミド化合物、及び（Ｂ）第四級フッ化アルキルアンモニウム又はその水和物を含有する分解洗浄組成物であって、（Ａ）Ｎ－置換アミド化合物のアミド窒素原子のα位にある炭素原子上の２個の水素原子がオキソ基で置換された化合物であるＮ－置換アミド酸化誘導体の含有量が、５５０質量ｐｐｍ以下である、分解洗浄組成物。</abstract><oa>free_for_read</oa></addata></record>
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subjects	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CLEANING CLEANING IN GENERAL DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING TRANSPORTING USE OF SINGLE SUBSTANCES AS DETERGENTS
title	DECOMPOSING/CLEANING COMPOSITION, METHOD FOR PRODUCING SAME, AND METHOD FOR CLEANING ADHESIVE POLYMER
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