EVAPORATION APPARATUS, VAPOR DEPOSITION APPARATUS, AND EVAPORATION METHOD
An evaporation apparatus (100) is described, particularly for evaporating a reactive material such as lithium. The evaporation apparatus (100) includes an evaporation crucible (110) for evaporating a liquid material (105), a material conduit (120) for supplying the liquid material (105) to the evapo...
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| creator | BUSCHBECK, Wolfgang BANGERT, Stefan |
| description | An evaporation apparatus (100) is described, particularly for evaporating a reactive material such as lithium. The evaporation apparatus (100) includes an evaporation crucible (110) for evaporating a liquid material (105), a material conduit (120) for supplying the liquid material (105) to the evaporation crucible (110), and a valve (150) configured to close the material conduit (120) by solidifying a part of the liquid material (105) in the material conduit (120) with a cooling device (152). The valve (150) may include a cooling gas supply (154) for a cooling gas (106), and the cooling device (152) may be configured to cool the liquid material (105) with the cooling gas (106). Further described are a vapor deposition apparatus (200) for coating a substrate as well as an evaporation method.
L'invention concerne un appareil d'évaporation (100), en particulier pour l'évaporation d'une matière réactive telle que le lithium. L'appareil d'évaporation (100) comprend un creuset d'évaporation (110) pour l'évaporation d'une matière liquide (105), un conduit de matière (120) pour l'alimentation, avec la matière liquide (105), du creuset d'évaporation (110), et une vanne (150) configurée pour fermer le conduit de matière (120) par la solidification d'une partie de la matière liquide (105) dans le conduit de matière (120) avec un dispositif de refroidissement (152). La vanne (150) peut comprendre une alimentation en gaz de refroidissement (154) pour un gaz de refroidissement (106), et le dispositif de refroidissement (152) peut être configuré pour refroidir la matière liquide (105) avec le gaz de refroidissement (106). L'invention concerne en outre un appareil de dépôt en phase vapeur (200) pour le revêtement d'un substrat ainsi qu'un procédé d'évaporation. |
| format | Patent |
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L'invention concerne un appareil d'évaporation (100), en particulier pour l'évaporation d'une matière réactive telle que le lithium. L'appareil d'évaporation (100) comprend un creuset d'évaporation (110) pour l'évaporation d'une matière liquide (105), un conduit de matière (120) pour l'alimentation, avec la matière liquide (105), du creuset d'évaporation (110), et une vanne (150) configurée pour fermer le conduit de matière (120) par la solidification d'une partie de la matière liquide (105) dans le conduit de matière (120) avec un dispositif de refroidissement (152). La vanne (150) peut comprendre une alimentation en gaz de refroidissement (154) pour un gaz de refroidissement (106), et le dispositif de refroidissement (152) peut être configuré pour refroidir la matière liquide (105) avec le gaz de refroidissement (106). L'invention concerne en outre un appareil de dépôt en phase vapeur (200) pour le revêtement d'un substrat ainsi qu'un procédé d'évaporation.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220324&DB=EPODOC&CC=WO&NR=2022060570A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220324&DB=EPODOC&CC=WO&NR=2022060570A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BUSCHBECK, Wolfgang</creatorcontrib><creatorcontrib>BANGERT, Stefan</creatorcontrib><title>EVAPORATION APPARATUS, VAPOR DEPOSITION APPARATUS, AND EVAPORATION METHOD</title><description>An evaporation apparatus (100) is described, particularly for evaporating a reactive material such as lithium. The evaporation apparatus (100) includes an evaporation crucible (110) for evaporating a liquid material (105), a material conduit (120) for supplying the liquid material (105) to the evaporation crucible (110), and a valve (150) configured to close the material conduit (120) by solidifying a part of the liquid material (105) in the material conduit (120) with a cooling device (152). The valve (150) may include a cooling gas supply (154) for a cooling gas (106), and the cooling device (152) may be configured to cool the liquid material (105) with the cooling gas (106). Further described are a vapor deposition apparatus (200) for coating a substrate as well as an evaporation method.
L'invention concerne un appareil d'évaporation (100), en particulier pour l'évaporation d'une matière réactive telle que le lithium. L'appareil d'évaporation (100) comprend un creuset d'évaporation (110) pour l'évaporation d'une matière liquide (105), un conduit de matière (120) pour l'alimentation, avec la matière liquide (105), du creuset d'évaporation (110), et une vanne (150) configurée pour fermer le conduit de matière (120) par la solidification d'une partie de la matière liquide (105) dans le conduit de matière (120) avec un dispositif de refroidissement (152). La vanne (150) peut comprendre une alimentation en gaz de refroidissement (154) pour un gaz de refroidissement (106), et le dispositif de refroidissement (152) peut être configuré pour refroidir la matière liquide (105) avec le gaz de refroidissement (106). L'invention concerne en outre un appareil de dépôt en phase vapeur (200) pour le revêtement d'un substrat ainsi qu'un procédé d'évaporation.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB0DXMM8A9yDPH091NwDAhwBDJDg3UUwKIKLq4B_sGe6HKOfi4KyNp8XUM8_F14GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8uL-RgZGRgZmBqbmBo6ExcaoAFxIuVA</recordid><startdate>20220324</startdate><enddate>20220324</enddate><creator>BUSCHBECK, Wolfgang</creator><creator>BANGERT, Stefan</creator><scope>EVB</scope></search><sort><creationdate>20220324</creationdate><title>EVAPORATION APPARATUS, VAPOR DEPOSITION APPARATUS, AND EVAPORATION METHOD</title><author>BUSCHBECK, Wolfgang ; BANGERT, Stefan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2022060570A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>BUSCHBECK, Wolfgang</creatorcontrib><creatorcontrib>BANGERT, Stefan</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BUSCHBECK, Wolfgang</au><au>BANGERT, Stefan</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EVAPORATION APPARATUS, VAPOR DEPOSITION APPARATUS, AND EVAPORATION METHOD</title><date>2022-03-24</date><risdate>2022</risdate><abstract>An evaporation apparatus (100) is described, particularly for evaporating a reactive material such as lithium. The evaporation apparatus (100) includes an evaporation crucible (110) for evaporating a liquid material (105), a material conduit (120) for supplying the liquid material (105) to the evaporation crucible (110), and a valve (150) configured to close the material conduit (120) by solidifying a part of the liquid material (105) in the material conduit (120) with a cooling device (152). The valve (150) may include a cooling gas supply (154) for a cooling gas (106), and the cooling device (152) may be configured to cool the liquid material (105) with the cooling gas (106). Further described are a vapor deposition apparatus (200) for coating a substrate as well as an evaporation method.
L'invention concerne un appareil d'évaporation (100), en particulier pour l'évaporation d'une matière réactive telle que le lithium. L'appareil d'évaporation (100) comprend un creuset d'évaporation (110) pour l'évaporation d'une matière liquide (105), un conduit de matière (120) pour l'alimentation, avec la matière liquide (105), du creuset d'évaporation (110), et une vanne (150) configurée pour fermer le conduit de matière (120) par la solidification d'une partie de la matière liquide (105) dans le conduit de matière (120) avec un dispositif de refroidissement (152). La vanne (150) peut comprendre une alimentation en gaz de refroidissement (154) pour un gaz de refroidissement (106), et le dispositif de refroidissement (152) peut être configuré pour refroidir la matière liquide (105) avec le gaz de refroidissement (106). L'invention concerne en outre un appareil de dépôt en phase vapeur (200) pour le revêtement d'un substrat ainsi qu'un procédé d'évaporation.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | EVAPORATION APPARATUS, VAPOR DEPOSITION APPARATUS, AND EVAPORATION METHOD |
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